2008
DOI: 10.1109/tnano.2008.2002648
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Large-Area Subwavelength Aperture Arrays Fabricated Using Nanoimprint Lithography

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Cited by 31 publications
(28 citation statements)
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“…The quality factor (resonant wavelength/line width) of the system was 152 (473 nm/3.1 nm). The obtained FOM is higher than that of the previously reported FOM in nanostructure-based aluminum sensors1516174142, the FOM value (108) of the gold mushroom arrays11 and the theoretically estimated upper limits (FOM = 108) of the ATR-coupling SPR sensors43. We also tested the bulk sensitivity of capped nanoslits with different ridge height (H = 35) as shown in Fig.…”
Section: Resultsmentioning
confidence: 73%
“…The quality factor (resonant wavelength/line width) of the system was 152 (473 nm/3.1 nm). The obtained FOM is higher than that of the previously reported FOM in nanostructure-based aluminum sensors1516174142, the FOM value (108) of the gold mushroom arrays11 and the theoretically estimated upper limits (FOM = 108) of the ATR-coupling SPR sensors43. We also tested the bulk sensitivity of capped nanoslits with different ridge height (H = 35) as shown in Fig.…”
Section: Resultsmentioning
confidence: 73%
“…The structure was fabricated in a pre-deposited three-layer MDM stack. J. L. Skinner et al in [70] explored the possibility of plasmonic biosensing using silver and aluminum nanohole arrays. Both arrays, with periodicity of 500 nm and nanohole diameters of 110 nm, were fabricated through NIL.…”
Section: Fabricationmentioning
confidence: 99%
“…The silicon master used in this study contained a large array (0.5 cm x 1 cm) of nanopillars (150 nm in diameter) created by interference lithography, which was described previously [22]. The template was first passivated by molecular vapor coating (MVC) with Nanonex Ultra-100.…”
Section: Passivation Of the Master Silicon Templatementioning
confidence: 99%