Wire-grid polarizers (WGPs) operating in the long-wave infrared (LWIR) bands are widely
used in infrared polarimetric imaging systems. The increasing
complexity of modern imaging environments presents additional
challenges for these polarizers. This study introduces a design method
and fabrication process for an encapsulated WGP. We investigate the
fabrication process of an Au/Si bilayer wire grid including
holographic interference lithography, reactive etching, and the
deposition of zinc sulfide (ZnS) film onto the grating structure. This
film not only protects the underlying metal wire-grid structures but
also enhances the transmittance as anti-reflective coating (ARC).
Experimental results indicate that the average transmittance of
transverse magnetic (TTM) polarized light exceeds 70% at
7–12.1 µm, with the TTM averaging over 80% between
7.6 µm and 10.4 µm. This design is particularly
effective in suppressing the resonance absorption peaks that typically
occur for the silicon element around 9 µm. The average
extinction ratio (ER) exceeds 30 dB across the LWIR, reaching
up to 35 dB within the range of 7–10.6 µm. The
encapsulated polarizers are desired to improve the durability of the
wire grid by sealing the metal wire-grid structures while increasing
both TTM and ER.