Chemical solution deposition (CSD) can offer economic access to large area coatings, which are required to handle significant amounts of energy in innovative applications. CSD represents an umbrella term encompassing various methods such as sol–gel, metallo‐organic decomposition (MOD), and chemical bath deposition (CBD), which are used for the fabrication of functional metal chalcogenide films. These methods are all based on the layer fabrication from precursors dissolved in the liquid phase, which are transformed into the final functional film material by different working principles. The differences are related to the involved chemistry, solvent, temperatures, and heating processes, as described herein. In addition, chemical and physical deposition methods are briefly compared, highlighting their advantages and disadvantages.