1994
DOI: 10.1016/0022-0248(94)91269-6
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Large diameter 6H-SiC for microwave device applications

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Cited by 82 publications
(24 citation statements)
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“…To achieve high resistivity SI SiC, vanadium is incorporated into the crystal during growth, acting as an amphoteric deep dopant. Various growth techniques have been developed to produce large-area single crystal SiC, including the modified Lely method ) and by physical vapour transport (Barrett et al 1993;Hobgood et al 1994;Augustine et al 1997). The main commercial growth technique for SiC substrates is physical vapour transport, with material available from Cree and a number of other suppliers (eg.…”
Section: Sic Materials Propertiesmentioning
confidence: 99%
“…To achieve high resistivity SI SiC, vanadium is incorporated into the crystal during growth, acting as an amphoteric deep dopant. Various growth techniques have been developed to produce large-area single crystal SiC, including the modified Lely method ) and by physical vapour transport (Barrett et al 1993;Hobgood et al 1994;Augustine et al 1997). The main commercial growth technique for SiC substrates is physical vapour transport, with material available from Cree and a number of other suppliers (eg.…”
Section: Sic Materials Propertiesmentioning
confidence: 99%
“…[1][2][3][4] These defects intersect the surface of (0001) oriented wafers sliced from such boules and limit the usable area of the substrate. This is problematic for the fabrication of large surface area devices intended for high voltage/high current applications.…”
Section: Introductionmentioning
confidence: 99%
“…Frank related the formation of pipes around superdislocations to the need of eliminating highly stressed regions around these defects. Now Frank's idea for the reason of the pipe formation is generally accepted [2][3][4][5][6][7][8][9][10], and the presence of superdislocations within the pipes (commonly growing in the crystal growth direction) is confirmed experimentally (e.g., [4,5]). …”
Section: Introductionmentioning
confidence: 99%