2013
DOI: 10.1063/1.4825225
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Large magneto-elastic anisotropy enhancement with temperature in composition-graded FeCoTa thin films

Abstract: Static and dynamic magnetic properties of composition-graded FeCoTa thin films were systematically studied with respect to temperature and the deposition power of Ta target. The magnetic anisotropy field and ferromagnetic resonance frequency were found to be increased with the increasing of deposition power of Ta target due to the enhancement of stress when Ta concentration is increased. Thermal stability of the films shows a very interesting behavior with a peculiar and large increasing of magnetic anisotropy… Show more

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Cited by 16 publications
(23 citation statements)
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“…41,43 Note that the magnetic anisotropy arising from gradient composition sputtering is also of stress-induced origin due to the substitution of larger Ta atoms into Fe or Co sites, which generates a compressive stress along the hard axis. 41 Hence, even without E-field, the composition-graded FeCoTa film already has a large uniaxial magnetic anisotropy which manifests itself as the high f FMR of 7.2 GHz for the unpoled as-deposited sample. It is well known from Kittel's equation that f FMR is related to H K and M S as follows: 41…”
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confidence: 98%
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“…41,43 Note that the magnetic anisotropy arising from gradient composition sputtering is also of stress-induced origin due to the substitution of larger Ta atoms into Fe or Co sites, which generates a compressive stress along the hard axis. 41 Hence, even without E-field, the composition-graded FeCoTa film already has a large uniaxial magnetic anisotropy which manifests itself as the high f FMR of 7.2 GHz for the unpoled as-deposited sample. It is well known from Kittel's equation that f FMR is related to H K and M S as follows: 41…”
mentioning
confidence: 98%
“…Technical details of the gradientcomposition sputtering setup can be found in our previous papers. 41 The stress-induced in-plane uniaxial magnetic anisotropy arising from composition gradient has an easy axis along applied during the deposition to assist the inducement of magnetic anisotropy. A film of Au (100 nm) with a thin Ti buffer layer (10 nm) was deposited on the back side of the substrate as illustrated in Fig.…”
mentioning
confidence: 99%
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“…In recent years, more and more attentions have been focused on the electromagnetic microwave absorption and electromagnetic interference shielding materials [1][2][3][4][5][6][7]. To obtain highefficient microwave absorption materials, there are two key problems to overcome [8].…”
Section: Introductionmentioning
confidence: 99%