2020
DOI: 10.1109/ted.2020.2966434
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Large-Scale Fabrication of Submicrometer-Gate-Length MOSFETs With a Trilayer PtSe2 Channel Grown by Molecular Beam Epitaxy

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Cited by 22 publications
(25 citation statements)
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“…However, so far, only a few large-scale production methods combining van der Waals epitaxy and standard semiconductor processing have been reported. [19][20][21] There is a variety of 2D crystal growth techniques which has been studied for the synthesis of 2D materials over large areas: chemical vapor deposition (CVD), [22] physical vapor deposition (PVD) [23] , pulsed-laser deposition (PLD), [24] and molecular beam epitaxy (MBE). [25] CVD shows excellent growth uniformity for few layers growth, but defect and impurity densities can be high due to the use of gas carriers with extrinsic elements.…”
Section: Introductionmentioning
confidence: 99%
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“…However, so far, only a few large-scale production methods combining van der Waals epitaxy and standard semiconductor processing have been reported. [19][20][21] There is a variety of 2D crystal growth techniques which has been studied for the synthesis of 2D materials over large areas: chemical vapor deposition (CVD), [22] physical vapor deposition (PVD) [23] , pulsed-laser deposition (PLD), [24] and molecular beam epitaxy (MBE). [25] CVD shows excellent growth uniformity for few layers growth, but defect and impurity densities can be high due to the use of gas carriers with extrinsic elements.…”
Section: Introductionmentioning
confidence: 99%
“…However, so far, only a few large‐scale production methods combining van der Waals epitaxy and standard semiconductor processing have been reported. [ 19–21 ]…”
Section: Introductionmentioning
confidence: 99%
“…i) Summary of the On/Off ratio of a range of FETs based on different PtSe 2 thicknesses. [5,8,21,[26][27][28][29][30][31][32][33] c,d) Reproduced with permission. [5] Copyright 2016, Wiley-VCH.…”
Section: Field-effect Transistorsmentioning
confidence: 99%
“…It can be seen from Table 2 that the majority of PtSe 2 -FETs have a back-gate configuration except for two reports on buried-gate FETs using MBE and TAC PtSe 2 films. [27,32] The study based on TAC thin films (Figure 8a) outlined an interesting approach to lowering the contact resistance. [32] The devices started out with relatively thick film of PtSe 2 which was thinned locally in the channel region (i.e., a recessed channel).…”
Section: Field-effect Transistorsmentioning
confidence: 99%
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