2018
DOI: 10.1039/c8ra02644k
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Large-scale high-numerical-aperture super-oscillatory lens fabricated by direct laser writing lithography

Abstract: Super-oscillatory lens achieving sub-Abbe–Rayleigh diffraction limit focusing in the optical far-field were produced by direct laser writing (DLW) lithography method.

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Cited by 25 publications
(20 citation statements)
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“…One of them is an optimal combination of fabrication throughput and size of the final structures. There was always a drive behind making 3DLL structures as large as needed for functional applications without compromising on the achievable resolution [7,[19][20][21][22][23][24]. This is directly tied to how the material is exposed by the laser beam.…”
Section: Introductionmentioning
confidence: 99%
“…One of them is an optimal combination of fabrication throughput and size of the final structures. There was always a drive behind making 3DLL structures as large as needed for functional applications without compromising on the achievable resolution [7,[19][20][21][22][23][24]. This is directly tied to how the material is exposed by the laser beam.…”
Section: Introductionmentioning
confidence: 99%
“…The downside of this approach is the printing area being confined to a working field of an objective which is in the order of several hundred μm. If structure dimensions exceeded the working area of an objective (which is the case for most RMapplicable structures), it had to be divided into segments which were then printed one by one, resulting in stitching between segments [67][68][69][70]. Stitches induce optical and mechanical defects which might compromise functionality of the structure.…”
Section: Initiation Propagation Terminationmentioning
confidence: 99%
“…Notably, parallel fabrication of optical elements is becoming the main trend instead of the complex and time-consuming processes such as electron beam lithography (EBL) and focused ion beam etching (FIB). 15,[26][27][28][29] Recently, direct laser writing (DLW) lithography was employed to fabricate a planar lens, 30,31 but several square regions were joined together to acquire a hundreds of micrometers device and an apparent misalignment could be found. Through pushing the smallest line width of the planar SOLs up to tens of micrometers, we just realized centimeter-scale SOLs by employing the normal lithography process at the wafer level.…”
Section: Introductionmentioning
confidence: 99%