Large uniaxial magnetocrystalline anisotropy for Co₅₀Pt₅₀disordered alloy films with hexagonal-close-packed stacking structure by substituting Pt with Rh

Perpendicular magnetic anisotropy in CoXPd100−X alloys for magnetic tunnel junctions

“…[24] The shifting of the major peak to the left as the Pd concentration increases may be due to increasing strain in the lattice as the larger Pd atoms substitute for the Co. Similar shifts were observed by N. Nozawa, et al [25] …”

“…As shown in the X-ray diffraction spectra in Figure 4, the crystal structure of the film was determined to be fcc with a clear (111) peak observable in all samples at roughly 42 o , [24,25] while 39.4% Co to 14.9% Co show a weak (200) peak at roughly 48 o . [24] The shifting of the major peak to the left as the Pd concentration increases may be due to increasing strain in the lattice as the larger Pd atoms substitute for the Co.…”

“…[14][15][16][17] However, there has been very little exploration of CoPd alloys as pinning layers for pMTJ's. The similar alloy CoPt has also been demonstrated to possess similar perpendicular anisotropy and be utilized in a pMTJ [18][19][20][21][22]. In this paper we have studied the properties of CoPd alloys as a function of composition, thickness, growth temperature and postdeposition annealing.…”

Effect of additional elements on compositional modulated atomic layered structure of hexagonal Co80Pt20 alloy films with superlattice diffraction

“…[1][2][3][4][5][6] In practice, for current perpendicular recording medium, granular film which consists of CoPt alloy and oxide has been widely used. To increase thermal stability of the recording medium, the enhancement of K u is indispensable.…”

“…In general, to further increase K u of a CoPt alloy film, the approach of increasing spin-orbital interaction is considered effective. Many researchers reported that the enhancement of the spin-orbital interaction can be realized by the formation of a perfect hcp stacking structure (-A-B-A-B) without stacking faults (SFs) 4,[7][8][9][10][11] and the realization of a compositionally modulated atomic layer structure. 12,13 One of the methods to achieve these kinds of structures is the application of a substrate heating process during sputtering the CoPt alloy film to promote atomic migration to induce the regularity of the atomic layer sequence and site arrangement.…”