Laser ablation of toluene liquid for surface micro-structuring of silica glass

Deep plasma etching of glass with a silicon shadow mask

“…Ion milling utilizing noble gas ions can be used for etching materials which cannot easily be etched chemically [5]. Laser ablation [6,7], which is also used for producing distinct * Tel. : +358 20 7226607; fax: +358 20 7227012.…”

Surface Micro-Structuring of Silica Glass by Laser-induced Backside Wet Etching

“…5-15 μm in width, which was free of debris and microcracks around the area, were fabricated by UV laser irradiation using a single-mode laser beam. 25,29,35) The laser irradiation was carried out at laser power of 1-10 μJ pulse -1 with the repetition rate of 5-100 kHz. The laser beam was scanned on the sample surface at the rate of 50-100 mm s -1 .…”

“…1 μm. 13,20,25) The surface structures of etched patterns were analyzed using a confocal scanning laser microscope (Keyence, VK-8500) and scanning electron micrograph (Keyence, VE-7800). Figure 2 shows well-defined etching structures on silica glass, which were free of debris and microcracks around the area.…”

“…This estimate suggests that the laser irradiation of toluene liquid provided a unique environment under a transient high pressure. Upon DPSS UV laser irradiation at a high repetition rate, the vapour formation might be adversely affected because the period for the expansion and contraction of a vapour bubble was in the order of microsecond 25,31) . When the repetition rate of the laser irradiation increased up to 100 kHz, the signal of pressure impulses was able to detect clearly 33) .…”

“…According to optical images monitored by time-resolved shadowgraph technique, the laser vaporization of toluene liquid showed shockwave propagation and vapour expansion at the interface between silica glass and toluene liquid 15,19,21,22,25,31,33) .…”