“…[96,100,103,105], is demonstrated to be effectively removed from the surface of Au, Mo, Si, membranes, polyamide photorest films, polymers, etc., by steam laser cleaning. For instance, Leiderer and co-workers [136][137][138][139][140][141][142] have systemically studied the steam laser cleaning of micro-and submicron spherical particles from silicon wafer. Additionally, Garrison and co-workers [143] studied the laser-induced pressure wave propagation by a combined molecule dynamics and finite element method.…”