2005
DOI: 10.4028/www.scientific.net/ssp.103-104.185
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Laser Cleaning of Particles from Silicon Wafers: Capabilities and Mechanisms

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Cited by 8 publications
(4 citation statements)
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“…[96,100,103,105], is demonstrated to be effectively removed from the surface of Au, Mo, Si, membranes, polyamide photorest films, polymers, etc., by steam laser cleaning. For instance, Leiderer and co-workers [136][137][138][139][140][141][142] have systemically studied the steam laser cleaning of micro-and submicron spherical particles from silicon wafer. Additionally, Garrison and co-workers [143] studied the laser-induced pressure wave propagation by a combined molecule dynamics and finite element method.…”
Section: Surface Cleaningmentioning
confidence: 99%
“…[96,100,103,105], is demonstrated to be effectively removed from the surface of Au, Mo, Si, membranes, polyamide photorest films, polymers, etc., by steam laser cleaning. For instance, Leiderer and co-workers [136][137][138][139][140][141][142] have systemically studied the steam laser cleaning of micro-and submicron spherical particles from silicon wafer. Additionally, Garrison and co-workers [143] studied the laser-induced pressure wave propagation by a combined molecule dynamics and finite element method.…”
Section: Surface Cleaningmentioning
confidence: 99%
“…Proposed by de Groot et al in 1983, [3] the half metallic ferromagnetism characterizes Heusler materials used nowadays for spin injection devices [4] which behave like semiconductor for one spin direction and like metal for the other spin direction, leading to a 100% spin polarization of electrons, at the Fermi level. Apart from spintronics, Heusler compounds with high spin polarization, high Curie temperature and simultaneously a low saturation magnetization are suitable for ultrahigh density magnetic memory storage devices [5].…”
Section: Introductionmentioning
confidence: 99%
“…Optimum efficiency for the experimental process necessitates a careful selection of wavelength for a specific particle size and refractive index. Numerous reports exist of the capabilities of KrF at λ = 248 nm [3,22] and femtosecond laser at λ = 800 nm and 100 fs specification [23,24]. These two wavelengths were considered in this work as comparisons for future experimental work.…”
Section: Resultsmentioning
confidence: 99%