Laser damage of silica and hafnia thin films made with different deposition technologies

Abstract

A comparative study is made on the laser damage resistance of monolayers coatings made with different technologies. Hf O2 and SiO2 thin films have been deposited on fused silica substrates with Dual Ion Beam Sputtering, Electron Beam Deposition (with and without Ion Assistance) and Reactive Low Voltage Ion Plating technologies. The laser damage thresholds of these coatings have been determined at 1064nm and 355nm using a nanosecond pulsed YAG laser, and a 1-on-1 test procedure.