Laser damage threshold of vanadium dioxide film

Abstract

Vanadium dioxide film can be used to anti-laser interference infrared detector. If the laser energy is strong enough, the film may also be damaged under laser irradiation. VO2 thin films were prepared on sapphire substrates by molecular beam epitaxy. The laser damage threshold test of VO2 film was designed. VO2 film was irradiated with 1064 nm laser, and the damage characteristics of the film were observed by metallographic microscope. The damage threshold of the film was determined according to the damage morphology. The experimental equipment of laser pretreatment to enhance the film damage threshold was set up, and the laser energy of 20%-90% of the film damage threshold was used to pretreat the film. It is found that there is an optimal pretreatment energy for raising the damage threshold of vanadium dioxide films by laser pretreatment, and the optimal pretreatment energy is 60% of the damage threshold energy. The damage threshold of vanadium dioxide films pretreated with this energy was increased by about 31%.