Atomic hydrogen photodesorbs from the Si(100)−(2 × 1):H monohydride surface at 157 nm, with a cross
section of ∼3 × 10-21 cm2. We determine using polarized light that the transition dipole moment for the
optical excitation is oriented at ∼18° from the surface normal, as expected for the σ → σ* transition within
the H−Si bond. This result unambiguously establishes the dissociation of the H−Si surface bond by direct
optical excitation. The dynamics of this process is characterized by a translational energy of 〈E
trans〉 = 0.24
± 0.02 eV for atomic H and an isotope effect in photodesorption yield of y
H/y
D = 10 ± 3. We carry out
time-dependent quantum mechanical simulation on ab initio potential energy surfaces. The simulation suggests
a subfemtosecond lifetime in the excited state and a quantum yield for atomic hydrogen desorption of the
order 10-5. This study provides an extreme example for bond-selective photochemistry in large chemical
systems. In addition to its significance in understanding ultrafast surface dynamic processes, the direct
photodesorption process demonstrated here may also find applications as resistless photolithography in
semiconductor technology.