Laser-induced reactions of semiconductor surfaces

Qin, Qi‐Zong; Li, Y. L.; Lu, P. H.; Zhang, Z. J.; Jin, Zhong; Zheng, Qike

doi:10.1116/1.586302

Cited by 15 publications

(1 citation statement)

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“…Because of the technological importance of these processes, many studies (only some of which are listed here) have looked at how ion beams and plasmas (32)(33)(34)(35)(36)(37), as well as the individual constituents of plasmas [e.g. ions , atoms (38)(39)(40)(41), radicals (26,(42)(43)(44)(45), hot molecules (46,47), electrons (48)(49)(50)(51)(52)(53)(54)(55), and photons (56)(57)(58)(59)(60)(61)(62)(63)(64)(65)(66)(67)(68)(69)], act to etch semiconductor substrates.…”

Section: Introductionmentioning

confidence: 99%

Fundamental Studies of Halogen Reactions With Iii-v Semiconductor Surfaces

Simpson

Yarmoff

1996

Annu. Rev. Phys. Chem.

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It is technologically important to understand how halogens react with semiconductor surfaces because halogen compounds are commonly used to etch semiconductor wafers in the microelectronics industry. Halogens are also model adsorbates for studying chemisorption on covalently bonded materials, such as semiconductors, owing to the simple nature of the bonds that they form. The growing use of III-V materials in the manufacture of optoelectronic devices has prompted investigations of the reactions of molecular halogens (XeF 2 , Cl 2 , Br 2 , and I 2 ) with III-V semiconductor surfaces (GaAs, GaSb, InP, InAs, and InSb). This review examines the more fundamental of these investigations, which involve model systems in ultra-high vacuum, focusing on the chemistry of the halogen surface reactions and the physical and electronic structure of the reacted surfaces.

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Section: Introductionmentioning

confidence: 99%

Fundamental Studies of Halogen Reactions With Iii-v Semiconductor Surfaces

Simpson

Yarmoff

1996

Annu. Rev. Phys. Chem.

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Molecular Beam Studies on the Laser‐Enhanced Surface Reaction of GaAs(100) with Chlorine

Qin

Zhang

et al. 1995

J Chinese Chemical Soc

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A cw supersonic Cl2 molecular beam coupled with an angle‐resolved time‐of‐flight (TOF) technique has been used to investigate the laser‐enhanced surface reaction of GaAs(100) with chlorine. The mass and velocity distributions of the major reaction products under 1064 nm laser irradiation have been measured as a function of laser fluence, detection angle, surface temperature and normal component of the translational energy of the incident chlorine molecules. It has been found that increasing both laser fluence and the translational energy of incident chlorine molecules markedly enhance mis surface reaction. The measured flux angular distributions of major reaction products can be fit satisfactorily with a bi‐cosine function. Measurements of the mass and angular distributions of reaction products by a modulated molecular beam mass spectrometry show that the surface temperature effect is obvious for the Cl2/GaAs(100) “dark” thermal reaction. A direct activated dissociative chemisorption is proposed for the mechanism of Cl2 chemisorption on the GaAs(100) surface.

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