“…Copper deposition has been achieved by using Cu(HFAc)2 [bis-(l,l,l,5,5,5-hexafluoro-2,4-pentanedionate)copper(II)] (Figure 4);149-163 gold deposition has employed Me2Au- (AcAc) [dimethylgold(III) acetylacetonate] and its two (AcAc)3 [iridium acetylacetonate];160 and palladium deposition has employed Pd(HFAcAc)2 (and films of PdAcAc and PdAc). 163 In this last study, spatially localized Pd thin films deposited on polyimide using 351 nm from an argon ion laser served as sites for further growth of copper by electroless deposition. In another AcAc study, Pt films were deposited from Pt(HFAcAc)2 in a hybrid mode, with only photodeposition occurring initially on the transparent substrate and then with pyrolytic deposition beginning only after the photodeposition of a thin, absorbing Pt film.20 Furthermore, in a related study162b it was shown that with a small increase in the laser-induced temperature rise, by a few tens of degrees, photolytic deposition of Pt went from being dominated by the photolysis of surface-adsorbed species to the photolysis of gas-phase Pt(HFAcAc)2 molecules.…”