2007
DOI: 10.1116/1.2800328
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Laser interferometric nanolithography using a new positive chemical amplified resist

Abstract: The authors report on the progress of laser interference lithography at 266nm laser wavelength with a chemical amplified resist containing a polyvinyl derivate dissolved in propylene glycol monoethyl ether ester. A continuous-wave deep-UV source combined with a Lloyd mirror is a simple and useful tool for the fabrication of nanoscale periodic structures generally called nanoarrays. Aiming for a robust pattern transfer technique to fabricate nanoarrays into magnetic materials, the authors investigated the utili… Show more

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Cited by 20 publications
(18 citation statements)
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“…Nano-lithographical methods (e.g. Luttge et al 2007) can be applied to integrate nanochannels with even smaller dimensions.…”
Section: Micro-to Nanofluidic Via Technologymentioning
confidence: 99%
“…Nano-lithographical methods (e.g. Luttge et al 2007) can be applied to integrate nanochannels with even smaller dimensions.…”
Section: Micro-to Nanofluidic Via Technologymentioning
confidence: 99%
“…We tested this model on patterned media prepared by laser interference lithography (LIL) [Haast et al, 1998]. BPM fabricated by LIL form excellent test media because the interference patterns have perfect positioning [Luttge et al, 2007]. Random translations, such as in self-assembled or e-beam generated media, are therefore absent, and the fluctuations in the position of the islands are caused by shape fluctuations only.…”
Section: Introductionmentioning
confidence: 99%
“…Therefore a second fabrication method was developed [195] that can result in a higher dot density. A new trilayer resist system is used for which the process scheme is depicted on the right of figure 4.6.…”
Section: Pre-patterning By Reactive Ion Etchingmentioning
confidence: 99%