2022
DOI: 10.1021/acsami.2c08430
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Laser Irradiation Effect on the p-GaSe/n-HfS2 PN-Heterojunction for High-Performance Phototransistors

Abstract: Two-dimensional (2D)-based PN-heterojunction revealed a promising future of atomically thin optoelectronics with diverse functionalities in different environments. Herein, we reported a p-GaSe/n-HfS2 van der Waals (vdW) heterostructure for high-performance photodetectors and investigated the laser irradiation effect on the fabricated device. The fabricated 2D vdW heterostructure revealed a high photoresponsivity of 1 × 104 A W–1 with a photocurrent value of 377 nA due to unique type-II band alignment and enhan… Show more

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Cited by 7 publications
(10 citation statements)
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“…This report indicates that high power laser irradiation has also significant effect for tunning the semiconducting devices. [ 121 ] 2D vdWs heterostructures not only considered for developing the FETs devices but also are worthy choice to construct other potential electronic devices such as memristor based neuromorphic devices. Memristor based neuromorphic computing that have following conditions for developments; (1) fast switching, (2) high density integration and (3) energy efficient.…”
Section: Applicationsmentioning
confidence: 99%
See 2 more Smart Citations
“…This report indicates that high power laser irradiation has also significant effect for tunning the semiconducting devices. [ 121 ] 2D vdWs heterostructures not only considered for developing the FETs devices but also are worthy choice to construct other potential electronic devices such as memristor based neuromorphic devices. Memristor based neuromorphic computing that have following conditions for developments; (1) fast switching, (2) high density integration and (3) energy efficient.…”
Section: Applicationsmentioning
confidence: 99%
“…(c,d) Reproduced with permission. [ 121 ] Copyright 2022, American Chemical Society. e) Schematic diagram of Ag/SnS/Pt based memristor f) Electro‐optical characteristics of device under 4 V/1.5 ns voltage pulse.…”
Section: Applicationsmentioning
confidence: 99%
See 1 more Smart Citation
“…In addition, the conduction band edge of HfS 2 is located at 5.2 eV which is a large value compared with other TMDs. [27,28] Therefore, the difference between the conduction band edge of HfS 2 and the valence band edge of MoS 2 is small, enabling the formation of an interlayer bandgap that is sufficiently narrow for IR detection. [26,28] Furthermore, the significant contribution of the built-in potential within the HfS 2 /MoS 2 heterojunction was instrumental in achieving exceptional photoresponse in the HfS 2 /MoS 2 photodetector.…”
Section: Introductionmentioning
confidence: 99%
“…Efforts to address these issues have been underway over the past two decades. Substantial progress has also been made in designing radiation‐hard thin films transistors (TFTs) with ZnO, Ga 2 O 3 , In 2 O 3 , SnO 2 , IGZO, SiC, GaN, and many other WBGs, [ 17–50 ] which are used in the CMOS integrated circuits (ICs) over a long period under various radiations. Emerging memory technologies were also developed to stabilize the data storage performance in high temperatures and extremely harsh environments.…”
Section: Introductionmentioning
confidence: 99%