2007
DOI: 10.1117/12.700899
|View full text |Cite
|
Sign up to set email alerts
|

Laser micromachining of optical biochips

Abstract: Optical biochips may incorporate both optical and microfluidic components as well as integrated light emitting semiconductor devices. They make use of a wide range of materials including polymers, glasses and thin metal films which are particularly suitable if low cost devices are envisaged. Precision laser micromachining is an ideal flexible manufacturing technique for such materials with the ability to fabricate structures to sub-micron resolutions and a proven track record in manufacturing scale up.Describe… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
5
0

Year Published

2009
2009
2021
2021

Publication Types

Select...
2
1

Relationship

0
3

Authors

Journals

citations
Cited by 3 publications
(5 citation statements)
references
References 8 publications
0
5
0
Order By: Relevance
“…However, it has greater effect on die strength which must be analyzed in depth for thin wafer dicing. INTRODUCTION femtosecond laser systems are becoming more established in industrial applications and have demonstrated high potential in thin wafer dicing [91][92][93]. Although much research have been carried out to push femtosecond laser into industrial application, the main obstacle of thermal damage and throughput still remain.…”
Section: Discussionmentioning
confidence: 99%
“…However, it has greater effect on die strength which must be analyzed in depth for thin wafer dicing. INTRODUCTION femtosecond laser systems are becoming more established in industrial applications and have demonstrated high potential in thin wafer dicing [91][92][93]. Although much research have been carried out to push femtosecond laser into industrial application, the main obstacle of thermal damage and throughput still remain.…”
Section: Discussionmentioning
confidence: 99%
“…The etch profiles were characterized by machining test pieces of each material and measuring the etch profile using a surface profilometer (Tencor P10, KLA-Tencor Instruments, USA) to allow accurate depth measurements to be taken across the region irradiated by the beam. For each material, a total of 25 pulses were incident at each point, and because the machining process is cumulative [10,17,18], the depth at any given point of the etched channel was assumed to be a scaled version of the etch profile obtained after one pulse for simulation purposes.…”
Section: Methodsmentioning
confidence: 99%
“…Such steps have not been considered here as they could potentially damage or influence other fabrication steps that may be needed to produce microfluidic devices, e.g. damage polymer layers used to isolate multi-layer dielectrophoresis microelectrodes, or cause migration of contaminants into doped silicon substrates [17][18][19].…”
Section: Methodsmentioning
confidence: 99%
See 2 more Smart Citations