face plasmon resonances, and fostered the development of advanced sensors. [2,3] Fabricated on dielectric materials, arrays of nano-holes -and more generally regularly-ordered structures composed of subwavelength-diameter holes -form the basis of the architecture of integrated two-dimensional photonic crystals and all-dielectric metasurfaces, able to confine and manipulate light at unprecedented levels (including amplitude, spectral and spatial management). [4] The usual technological approaches for such nanofabrication of both plasmonic and all-dielectric nanostructures rely on various tools and approaches, amongst which focused ion beam, electron beam, photolithography, reactive ion etching, etc. [5,6] These fabrication methods are mature and highly performant, however, they are slow and they require several steps and techniques that need to be optimized for each material used, thereby inevitably increasing the overall costs and complexity of the whole process.Future advanced devices are now calling for making use of the third dimension (Z) in addition to perfectly well controlled planar nanopatterns (in X and Y dimensions). [7] In particular, arrangements made of arrays of nanoholes with depths reaching at least several micrometers may greatly broaden the range of possible designs and functionalities of nanophotonic structures. [7,8] However, the technological fabrication of such deep holes with a cylindrical profile at the surface of materials is challenging. [9][10][11][12] Thus, introducing a versatile fabrication technique that adds the hole depth as a straightforward and independent degree of freedom holds promises to form advanced architectures. In this context, we explore ultrafast laser processing as a direct way to create deep air holes at the surface of a reference dielectric material, fused silica. By "direct" we mean that one hole is fabricated by a single-step process, consisting in only one laser shot to ablate matter, without any extra treatment (like chemical etching for example [13] ) nor translation of the target material. [14] Although the ultimate spatial resolution of direct laser ablation with ultrashort pulses has not reached yet sufficient performance standards to compete with traditional nanofabrication processes to fabricate functional nanophotonic components, our aim is to show it represents a route for an alternative and complementary solution with attractive advantages in terms of speed, maskless and single-step process, absence of need of vacuum environment or chemicals. Additionally, the nanostructures can be fabricated on a single