Laser scanning for semiconductor mask pattern generation

Renewing i-line laser mask writers with reduced power consumption and increased productivity

“…Software correction for this consistent non-linear displacement minimizes the actual linearity errors in the scan axis. Compared to an ALTA 3900, in the ALTA 3900DP the combination of the flat brush and the new scan lens brings the sound field of the AOM antiparallel to the scan axis, improving the sharpness of the aerial image which is especially important for consistently resolving small contacts and OPC features [1].…”