Laser Spike Annealing of DSA Photoresists

Abstract

The thermodynamic mismatch of different segments in a block copolymer drives microphase separation, while their covalent bonds limit the phase separated domains to the nanometer scale. As a result, densely arranged high resolution patterns, the goal of lithography, form a thermodynamically preferred equilibrium state for block copolymers. For production new annealing methods are being explored to speed up and improve structure formation. Solvent vapor annealing is a powerful technique to control the ordering process and the morphology of block copolymers by selectively or non-selectively swelling polymers. In recent years high are attracting more and more attention due to their potential to form small s using solvent vapor or increased temperature to enhance the polymer chain mobility is a key to increase ordering rate. In this paper, we review recent work on using solvent annealing to control the morphology and report high speed laser annealing of high for lithographic applications.

Accelerated Amidization of Branched Poly(ethylenimine)/Poly(acrylic acid) Multilayer Films by Microwave Heating

“…This photochemistry concept can be incorporated into custom synthesized polyelectrolytes to rapidly and selectively cross-link PEMs . Alternatively, a small molecule photosensitive cross-linker can be diffused into the PEM and subsequently photoexposed to cross-link the film. , Similarly, the need for fast directed self-assembly of nanostructures has led to the development of a wide variety of rapid annealing technologies, including rapid thermal processing, photothermal treatment, laser spike annealing, and microwave annealing. , These rapid processing techniques allow processing at temperatures above the degradation temperature of the polymer if the duration is sufficiently short . Among these, microwave treatment has been shown to effectively enhance the reaction kinetics to generate metal oxides in inorganic–organic hybrid films …”

Technological strategies for self-assembly of PS-b-PDMS in cylindrical sub-10 nm nanostructures for lithographic applications

“…They obtained a fingerprint like arrangement of parallel PDMS cylinders with dimension below 10 nm across large area of the sample upon 3 ms annealing at temperatures >440 °C. When the DBC film is confined in topographically defined trenches, the resulting cylindrical nanostructures are well aligned inside the guiding pattern upon a 20 ms long LSA treatment at 440 °C [79], as shown in Figure 4(f).…”

“…Figure 4(d) and (e) show representative LSA schematic apparatus and annealing process profile. Jiang et al reported the direct self-assembly of PS-b-PDMS with 23% of vinyl methyl siloxane by means of LSA [79]. They obtained a fingerprint like arrangement of parallel PDMS cylinders with dimension below 10 nm across large area of the sample upon 3 ms annealing at temperatures >440 °C.…”

Directed high‐χ block copolymer self‐assembly by laser writing on silicon substrate

“…18 Motivated by the versatility of the photo process, researchers have attempted to introduce laser photo-thermal processes to molecular self-assembly. [19][20][21][22][23][24][25][26][27][28][29][30][31][32][33][34] Visible to IR lasers have been widely utilized for photothermal process for molecular self-assembly to prevent decomposition of organic/polymeric species. In particular, extreme thermal fields from localized laser heating and millisecond transient heating have received the most attention, and rapid and directed molecular assembly based on laser photo-thermal processes have been reported.…”