1981
DOI: 10.1070/qe1981v011n02abeh005884
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Lasing as a result of aB–Xtransition in the excimer XeF formed as a result of photodissociation of KrF2in mixtures with Xe

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Cited by 5 publications
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“…The Kr 2 F excitation mechanism relies on the KrF 2 photodissociation absorption in the VUV spectral range around 164 nm [42] to produce KrF(B) excimers. The utilization of KrF(B) in secondary processes is different, depending on the composition and pressure of the working mixture.…”
Section: Kr 2 F Active Mediummentioning
confidence: 99%
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“…The Kr 2 F excitation mechanism relies on the KrF 2 photodissociation absorption in the VUV spectral range around 164 nm [42] to produce KrF(B) excimers. The utilization of KrF(B) in secondary processes is different, depending on the composition and pressure of the working mixture.…”
Section: Kr 2 F Active Mediummentioning
confidence: 99%
“…The utilization of KrF(B) in secondary processes is different, depending on the composition and pressure of the working mixture. For example, in low-concentration Xe admixtures, exchange processes take place, resulting in XeF(B) formation with a yield close to 100% and laser action at 353 nm upon pumping by radiation from exploding wire [42]. Being mixed with Kr at a pressure of ∼1 bar, KrF(B) forms Kr 2 F(4 2 Γ) excimers in three-body recombination collisions [43].…”
Section: Kr 2 F Active Mediummentioning
confidence: 99%