Lasing of ArF with a microsecond electron beam

Glessner, J. W.; McAuliffe, Michael J.; Smith, Bradley D.; Floyd, Kevin

doi:10.1063/1.349061

Cited by 4 publications

(1 citation statement)

References 12 publications

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“…The conversion of electrical power into 193 nm ArF * emission and 157 nm F * 2 emission is well understood from discharge pumped and electron-beam pumped ArF * [5,6] and F * 2 excimer lasers [7,8]. In laser devices, pulsed (several nanoseconds to 1 µs) power densities of order 10 5 W cm −3 pump dense rare gas halide mixtures.…”

Section: Discussionmentioning

confidence: 99%

Stable high brightness radio frequency driven micro-discharge lamps at 193 (ArF^*) and 157 nm ( )

Salvermoser¹,

Murnick²

2003

J. Phys. D: Appl. Phys.

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A stable discharge between two pin electrodes separated by several hundred micrometres in a high pressure rare gas (∼900 mbar) halogen (∼1 mbar) mixture is shown to yield continuous wave (CW) ultra violet (UV) and vacuum UV light sources. Lamps operating at 193 (ArF*) and 157 nm ( ) have been demonstrated. Total CW output power in the UV was measured to be 30 for ArF* and 20 mW for . The brightness of the light sources is estimated to be of the order of several W cm−2 sr−1. With direct current excitation, electrode lifetimes are limited to a few minutes due to fluorine salt deposits. However, using a radio frequency (RF) field to drive the discharge, the lifetime of the lamps increased to hundreds of hours. A one-dimensional model of the RF micro-discharge explaining the increase in electrode lifetime is presented. The technology described can be adapted to many other wavelengths and promises even higher powers in future.

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Section: Discussionmentioning

confidence: 99%

Stable high brightness radio frequency driven micro-discharge lamps at 193 (ArF^*) and 157 nm ( )

Salvermoser¹,

Murnick²

2003

J. Phys. D: Appl. Phys.

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Production of radical species by electron beam deposition in an ArF* lasing medium

Petrov

Wolford

Petrova

et al. 2017

Journal of Applied Physics

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The electron-beam-pumped ArF laser is a laser technology capable of providing very high lasing energies at the shortest wavelength (λ = 193 nm) among the rare gas halide lasers and therefore has the potential to be a superior driver for inertial fusion. The electron kinetics are rigorously treated by numerically solving the steady-state, spatially averaged electron Boltzmann equation in Ar-F2 gas. The e-beam energy deposition and collisional reaction rates with electrons are calculated from the electron energy distribution function for a wide range of e-beam deposition powers (Pbeam = 10 kW/cm3–3 MW/cm3) and fluorine concentrations (xF2 = 0.01 – 10%). The rates are reduced to a set of coefficients that are fitted with analytical formulas as a function of two universal parameters: Pbeam/p and xF2, where p is the gas pressure. It is found that in the regime of high e-beam power deposition, the fluorine molecules are rapidly destroyed through dissociative attachment and neutral dissociation. The loss of F2 over the duration of the beam is proportional to the e-beam energy deposition per unit volume, εbeam, and follows ΔnF2(cm−3)≅4×1017εbeam(J/cm3), in agreement with experimental data. The fluorine molecule conversion to other fluorine species, including atomic fluorine, is shown to have a very small effect on the index of refraction even at percent level concentrations.

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The Generation of Intense-Relativistic-Microsecond Electron Beams From a High-Energy-Density Marx Generator With Waveform Modification

Zhang

Zhou

Yang

et al. 2022

IEEE Trans. Plasma Sci.

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Lasing of ArF with a microsecond electron beam

Cited by 4 publications

References 12 publications

Stable high brightness radio frequency driven micro-discharge lamps at 193 (ArF^*) and 157 nm ( )

Stable high brightness radio frequency driven micro-discharge lamps at 193 (ArF^*) and 157 nm ( )

Production of radical species by electron beam deposition in an ArF* lasing medium

The Generation of Intense-Relativistic-Microsecond Electron Beams From a High-Energy-Density Marx Generator With Waveform Modification

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Lasing of ArF with a microsecond electron beam

Cited by 4 publications

References 12 publications

Stable high brightness radio frequency driven micro-discharge lamps at 193 (ArF*) and 157 nm ( )

Stable high brightness radio frequency driven micro-discharge lamps at 193 (ArF*) and 157 nm ( )

Production of radical species by electron beam deposition in an ArF* lasing medium

The Generation of Intense-Relativistic-Microsecond Electron Beams From a High-Energy-Density Marx Generator With Waveform Modification

Contact Info

Product

Resources

About

Stable high brightness radio frequency driven micro-discharge lamps at 193 (ArF^*) and 157 nm ( )

Stable high brightness radio frequency driven micro-discharge lamps at 193 (ArF^*) and 157 nm ( )