2023
DOI: 10.1021/acsnano.3c02411
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Lateral Integration of SnS and GeSe van der Waals Semiconductors: Interface Formation, Electronic Structure, and Nanoscale Optoelectronics

Abstract: The emergence of atomically thin crystals has allowed extending materials integration to lateral heterostructures where different 2D materials are covalently connected in the plane. The concept of lateral heterostructures can be generalized to thicker layered crystals, provided that a suitably faceted seed crystal presents edges to which a compatible second van der Waals material can be attached layer by layer. Here, we examine the possibility of integrating multilayer crystals of the group IV monochalcogenide… Show more

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Cited by 17 publications
(12 citation statements)
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“…Multimaterial multilayer lateral van der Waals heterostructures were prepared in several consecutive steps, starting with i) synthesis of SnS seed flakes that are used as the core of the heterostructures. The growth of SnS flakes is well established on a variety of substrates [ 21c,31 ] and with different thicknesses. [ 32 ] Here, SnS growth was performed by vapor transport from a SnS 2 precursor on HOPG.…”
Section: Resultsmentioning
confidence: 99%
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“…Multimaterial multilayer lateral van der Waals heterostructures were prepared in several consecutive steps, starting with i) synthesis of SnS seed flakes that are used as the core of the heterostructures. The growth of SnS flakes is well established on a variety of substrates [ 21c,31 ] and with different thicknesses. [ 32 ] Here, SnS growth was performed by vapor transport from a SnS 2 precursor on HOPG.…”
Section: Resultsmentioning
confidence: 99%
“…[ 32 ] Here, SnS growth was performed by vapor transport from a SnS 2 precursor on HOPG. [ 21c ] In the following steps, the precursor vapor was changed to ii) a mixture of GeS and GeSe in order to obtain a laterally attached band (I) of S‐rich GeS 1− x Se x alloy; iii) GeSe to attach a pure GeSe band; and finally iv) again a mixture of GeS and GeSe to terminate the heterostructure with another band (II) of GeS 1− x Se x alloy. The growth conditions used were suitable for the preferential incorporation of GeS [ 21a ] and GeSe [ 21c ] into the straight‐side facets of SnS seeds (see Experimental Section for details).…”
Section: Resultsmentioning
confidence: 99%
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