Lateral Resolution of Imaging Surface-Analytical Instruments as SIMS, AES and XPS: Application of the BAM-L200 Certified Reference Material and Related ISO Standards

Unger, Wolfgang; Senoner, Mathias; Wirth, Thomas; Bütefisch, Sebastian; Busch, I.

doi:10.1384/jsa.24.123

Cited by 5 publications

(6 citation statements)

References 6 publications

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“…Reference materials such as the BAM-L200-certified reference material can be used. 14 Other variants of the 86−14% criterion may be used, for example, 88−12% would correspond to the FWHM. Different probe profiles end up leading to different resolution criteria.…”

Section: Introductionmentioning

confidence: 99%

“…First, the threshold number is arbitrary. A more accurate approach would aim to reflect the average signal strength and average noise strength present in the image. − This way, the ability to transfer contrast across frequency is measured and a cutoff number that reflects the SNR statistics is selected. Second, preparing such a grating for chemical imaging is time consuming as it involves chemical etching, lithography, or other more advanced sample preparation techniques.…”

Section: Introductionmentioning

confidence: 99%

“…This distance corresponds to 2 σ the characteristic width of the Gaussian kernel. Reference materials such as the BAM-L200-certified reference material can be used . Other variants of the 86–14% criterion may be used, for example, 88–12% would correspond to the FWHM.…”

Section: Introductionmentioning

confidence: 99%

“…One of these ways involves preparing a grating with decreasing bar distance and calculating the contrast change with respect to different frequencies. This approach is taken in refs − , where a ground-truth image of the grating is needed. The MTF is defined as the ratio of the contrast of the MSI image and the contrast of the ground-truth image, both measured as a function of spatial frequencies.…”

Section: Introductionmentioning

confidence: 99%

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Modality Agnostic Model for Spatial Resolution in Mass Spectrometry Imaging: Application to MALDI MSI Data

et al. 2021

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Image resolution in mass spectrometry imaging (MSI) is governed by the sampling probe, the motion of the stage relative to the probe, and the noise inherent for the sample and instrumentation employed. A new image formation model accounting for these variables is presented here. The model shows that the size of the probe, stage velocity, and the rate at which the probe consumes material from the surface govern the amount of blur present in the image. However, the main limiting factor for resolution is the signal-to-noise ratio (SNR). To evaluate blurring and noise effects, a new computational method for measuring lateral resolution in MSI is proposed. A spectral decomposition of the observed image signal and noise is used to determine a resolution number. To evaluate this technique, a silver step edge was prepared. This device was imaged at different pixels sizes using matrix-assisted laser desorption/ionization mass spectrometry imaging (MALDI MSI). A modulation transfer function (MTF) and a noise power spectrum (NPS) were computed for each single-ion image, and resolution was defined as the point of intersection between the MTF and the NPS. Finally, the algorithm was also applied to a MALDI MSI tissue data set.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Modality Agnostic Model for Spatial Resolution in Mass Spectrometry Imaging: Application to MALDI MSI Data

et al. 2021

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“…4 The dimensions of the narrow lines and the A-B-A gratings are all in the submicrometre range. Most applications of BAM L200 are seen for the use of the grating method for a determination of lateral resolution in nanoscale imaging by SIMS (cf., e.g., references 4,[7][8][9][10][11][12][13][14][15] and AES (cf., e.g., references 4,[16][17][18][19] ). For XPS, there are only some implementations of the grating method using NanoESCA instruments (Omicron Nanotechnology) working as experimental end stations at synchrotron radiation sources.…”

Section: Introductionmentioning

confidence: 99%

Summary of ISO/TC 201 International Standard ISO 18516:2019 Surface chemical analysis—Determination of lateral resolution and sharpness in beam‐based methods with a range from nanometres to micrometres and its implementation for imaging laboratory X‐ray photoelectron spectrometers (XPS)

Unger

Senoner

Stockmann

et al. 2021

Surface & Interface Analysis

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ISO 18516:2019 Surface chemical analysis—Determination of lateral resolution and sharpness in beam‐based methods with a range from nanometres to micrometres revises ISO 18516:2006 Surface chemical analysis—Auger electron spectroscopy and X‐ray photoelectron spectroscopy—Determination of lateral resolution. It implements three different methods delivering parameters useful to express the lateral resolution: (1) the straight edge method, (2) the narrow line method and (3) the grating method. The theoretical background of these methods is introduced in ISO/TR 19319:2013 Surface chemical analysis—Fundamental approaches to determination of lateral resolution and sharpness in beam‐based methods. The revised International Standard ISO 18516 delivers standardized procedures for the determination of the (1) effective lateral resolution by imaging of square‐wave gratings, the (2) lateral resolution expressed as the parameter D12–88 characterizing the steepness of the sigmoidal edge spread function (ESF) determined by imaging a straight edge and (3) the lateral resolution expressed as the full width of half maximum of the line spread function (LSF), wLSF, determined by imaging a narrow line. The last method also delivers information on the shape of the LSF, which characterizes an individual imaging instrument. Finally, the implementation of all three standardized methods in the field of imaging laboratory X‐ray photoelectron spectroscopy (XPS) is shortly presented. This part of the letter is based on the use of a new test sample developed at ETH Zurich, Switzerland. This test sample displays a micrometre scaled pattern motivated by the resolving power of recent imaging XPS instruments.

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Sub-10 nm spatial resolution for electrical properties measurements using bimodal excitation in electric force microscopy

Kaja

Mariolle

Chevalier

et al. 2021

Review of Scientific Instruments

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We demonstrate that under ambient and humidity-controlled conditions, operation of bimodal excitation single-scan electric force microscopy with no electrical feedback loop increases the spatial resolution of surface electrical property measurements down to the 5 nm limit. This technical improvement is featured on epitaxial graphene layers on SiC, which is used as a model sample. The experimental conditions developed to achieve such resolution are discussed and linked to the stable imaging achieved using the proposed method. The application of the herein reported method is achieved without the need to apply DC bias voltages, which benefits specimens that are highly sensitive to polarization. Besides, it allows the simultaneous parallel acquisition of surface electrical properties (such as contact potential difference) at the same scanning rate as in amplitude modulation atomic force microscopy (AFM) topography measurements. This makes it attractive for applications in high scanning speed AFM experiments in various fields for material screening and metrology of semiconductor systems.

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Lateral Resolution of Imaging Surface-Analytical Instruments as SIMS, AES and XPS: Application of the BAM-L200 Certified Reference Material and Related ISO Standards

Cited by 5 publications

References 6 publications

Modality Agnostic Model for Spatial Resolution in Mass Spectrometry Imaging: Application to MALDI MSI Data

Modality Agnostic Model for Spatial Resolution in Mass Spectrometry Imaging: Application to MALDI MSI Data

Summary of ISO/TC 201 International Standard ISO 18516:2019 Surface chemical analysis—Determination of lateral resolution and sharpness in beam‐based methods with a range from nanometres to micrometres and its implementation for imaging laboratory X‐ray photoelectron spectrometers (XPS)

Sub-10 nm spatial resolution for electrical properties measurements using bimodal excitation in electric force microscopy

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