2022
DOI: 10.1088/1674-1056/ac2729
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Lateral β-Ga2O3 Schottky barrier diode fabricated on (–201) single crystal substrate and its temperature-dependent current–voltage characteristics

Abstract: Lateral β-Ga2O3 Schottky barrier diodes (SBDs) each are fabricated on an unintentionally doped (-201) n-type β-Ga2O3 single crystal substrate by designing L-shaped electrodes. By introducing sidewall electrodes on both sides of the conductive channel, the SBD demonstrates a high current density of 223 mA/mm and low specific on-resistance of 4.7 mΩ⋅cm2. Temperature-dependent performance is studied and the Schottky barrier height is extracted to be in a range between 1.3 eV and 1.35 eV at temperatures ranging fr… Show more

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Cited by 3 publications
(1 citation statement)
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“…The photodetector with MSM structure was fabricated on the β-Ga 2 O 3 film with T B = 700 °C. Si ion implantation process [17,18] was performed and followed by deposition of Ti/Au electrode. After lift-off process, the interdigital electrodes were formed and the rapid thermal annealing at 475 °C for 1 min was conducted.…”
Section: Methodsmentioning
confidence: 99%
“…The photodetector with MSM structure was fabricated on the β-Ga 2 O 3 film with T B = 700 °C. Si ion implantation process [17,18] was performed and followed by deposition of Ti/Au electrode. After lift-off process, the interdigital electrodes were formed and the rapid thermal annealing at 475 °C for 1 min was conducted.…”
Section: Methodsmentioning
confidence: 99%