2020
DOI: 10.1038/s41565-020-0743-0
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Layer-controlled single-crystalline graphene film with stacking order via Cu–Si alloy formation

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Cited by 96 publications
(58 citation statements)
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“…Very recently, Nguyen and colleagues reported the layer-controlled growth of wafer-scale uniformly oriented graphene layers on Cu-Si alloy films, including AB-stacked bilayer, ABAstacked trilayer, and ABCA-stacked tetralayer graphene films (Figure 6I,J) [104]. A wafer-scale (~1.5 × 3.5 cm 2 ) polycrystalline AB-stacked BLG film reportedly grown on a liquid Pt 3 Si/solid Pt substrate was recently published [105].…”
Section: Single-crystal Blg Grown From Multiple Nucleimentioning
confidence: 99%
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“…Very recently, Nguyen and colleagues reported the layer-controlled growth of wafer-scale uniformly oriented graphene layers on Cu-Si alloy films, including AB-stacked bilayer, ABAstacked trilayer, and ABCA-stacked tetralayer graphene films (Figure 6I,J) [104]. A wafer-scale (~1.5 × 3.5 cm 2 ) polycrystalline AB-stacked BLG film reportedly grown on a liquid Pt 3 Si/solid Pt substrate was recently published [105].…”
Section: Single-crystal Blg Grown From Multiple Nucleimentioning
confidence: 99%
“…Recently, the same group reported an improvement of a 99.4% AB-stacked graphene film with similar BLG coverage by extending the growth time to 10 h at an elevated growth temperature (1085°C) and they proposed that the twisted second layer was transformed to AB-stacked by carbon dissolutionsegregation processes [103]. Huang Images adapted, with permission, from [91,104]. Abbreviations: Gr, graphene.…”
Section: Single-crystal Blg Grown From Multiple Nucleimentioning
confidence: 99%
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“…[ 11–14 ] While the intrinsic physical properties of polycrystalline films have been comprehensively investigated in terms of micrometer‐scale grains, its inhomogeneity in a wafer scale limits application to integration challenges associated with structural defects such as grain boundaries and disorder. [ 15 ] The growth of single‐crystal (SC) monolayer and multilayer graphene films on SC Cu (111) and Cu–Si (111) surfaces has been demonstrated in a wafer scale, [ 16,17 ] whereas the growth of diatomic 2D SC film such as hBN and TMdCs remains still complicated due to their non‐centrosymmetric structures. [ 18 ] Recently, the self‐collimation of hBN grains on liquid Au substrate has been proposed for growing diatomic hBN SC film in a wafer scale but further study is required to grow other 2D vdW materials.…”
Section: Figurementioning
confidence: 99%
“…The detachment of graphene edges from growth substrate promotes the diffusion of active carbon species into the interface for the formation of bilayer graphene with a yield of 99%; [ 82 ] 2) the designs of high Ni concentration (23%) in Cu−Ni alloy and long growth time for the isothermal growth of bilayer graphene with a yield of 99.4%; [ 83 ] 3) the use of large‐area single‐crystal Cu/Ni(111) alloy with Ni concentration of 16.6% for the formation of bilayer graphene with a yield of almost 100%; [ 84 ] 4) the introduction of ultra‐low‐limit methane concentration (0.01, 0.03, 0.06, and 0.1%) on Cu–Si alloy to produce a SiC layer, achieving the control of graphene layer number from mono‐, bi‐, tri‐, and tetralayer graphene after the sublimation of Si atoms, respectively. [ 85 ] Drawing on these strategies, the uniform tBLG was expected to be formed.…”
Section: The Manufacturing Techniques Of Tblgmentioning
confidence: 99%