The gallium monochalcogenides family, comprising gallium
sulfide
(GaS), gallium selenide (GaSe), and gallium telluride (GaTe), is capturing
attention for its applications in energy storage and production, catalysis,
photonics, and optoelectronics. This interest originates from their
properties, which include an optical bandgap larger than those of
most common transition metal dichalcogenides, efficient light absorption,
and significant carrier mobility. For any application, stability to
air exposure is a fundamental requirement. Here, we perform a comparative
study of the stability of layered GaS, GaSe, and GaTe nanometer-thick
films down to a few layers with the goal of identifying the most suitable
Ga chalcogenide for future integration in photonic and optoelectronic
devices. Our study unveils a trend of decreasing air stability from
sulfide to selenide and finally to telluride. Furthermore, we demonstrate
a hydrogen passivation process to prevent the oxidation of GaSe with
a higher feasibility and durability than other state-of-the-art passivation
methods proposed in the literature.