“…[21][22][23] The structural instability of HPs becomes pronounced as the pattern dimension decreases to the sub-100 nm scale as a result of the increased surface-to-volume ratio, making them significantly unstable in ambient conditions. Diverse unconventional patterning methods have been employed based on soft lithography, such as imprinting, [24,25] micromolding, [26,27] ink-jet printing, [28] capillary bridge method, [29] wettability surface control, [30,31] and micro/nanopumping, [32] giving rise to well-defined patterns of HPs on the micrometer and few-hundred-nanometer scales without harming their intrinsic photophysical properties. However, further scaling down of the pattern size to sub-100 nm is challenging because of the difficulty in not only controlling the crystallization of HPs in such small dimensions but also ensuring the environmental stability of the patterned crystals.…”