“…The high temperature annealing treatments used in most studies place severe demands on the substrate material, which must act as the cathode current collector during battery operation but resist excessive oxidation and elemental interdiffusion during heat treatment, providing an additional incentive to reduce the annealing temperature. While many studies have used thin films of gold or platinum deposited on a ceramic [2,7,20,24,25,33,37,38], Filippin et al [18] have recently proposed the use of an oxidation resistant Ni-Al-Cr alloy, which may provide greater stability during annealing and cycling. Usually, the deposition rate achieved by RF sputtering is directly proportional to the power density applied to the target [39].…”