2023
DOI: 10.1002/smtd.202300206
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Ligand‐Crosslinking Strategy for Efficient Quantum Dot Light‐Emitting Diodes via Thiol‐Ene Click Chemistry

Abstract: While solution‐processable colloidal quantum dots (QDs) offer cost‐effective and large‐scale manufacturing, they can be susceptible to subsequent solution processes, making continuous processing challenging. To enable complex and integrated device architectures, robust QD films with subsequent patterning are necessary. Here, we report a facile ligand‐crosslinking strategy based on thiol‐ene click chemistry. Thiol molecules added to QD films react with UV light to form radicals that crosslink with QD ligands co… Show more

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Cited by 17 publications
(10 citation statements)
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“…In direct optical lithography, patterns are formed by photoinduced chemical reactions of photosensitive ligands or additives, which result in a solubility change of nanomaterials [e.g., metal oxide (16), PeNCs (17), and QDs (12)] at light-exposed regions without the need for a polymeric photoresist. Various photosensitive motifs and photochemical reactions such as azide (17)(18)(19)(20)(21), benzophenone (22), cinnamoyl (23), photo-acid generation (12), oxime sulfonate (13), thiol-ene (24)(25)(26)(27), photo-amine generation (28), oxide bridging (16), photo-oxidation (29), and alkene cross-linking (30) have been explored for direct optical patterning of colloidal emissive nanocrystals. However, the lithography process often induces substantial surface damage to the deposited emissive nanomaterials, thereby degrading their optical properties such as PLQY (13,17).…”
Section: Introductionmentioning
confidence: 99%
“…In direct optical lithography, patterns are formed by photoinduced chemical reactions of photosensitive ligands or additives, which result in a solubility change of nanomaterials [e.g., metal oxide (16), PeNCs (17), and QDs (12)] at light-exposed regions without the need for a polymeric photoresist. Various photosensitive motifs and photochemical reactions such as azide (17)(18)(19)(20)(21), benzophenone (22), cinnamoyl (23), photo-acid generation (12), oxime sulfonate (13), thiol-ene (24)(25)(26)(27), photo-amine generation (28), oxide bridging (16), photo-oxidation (29), and alkene cross-linking (30) have been explored for direct optical patterning of colloidal emissive nanocrystals. However, the lithography process often induces substantial surface damage to the deposited emissive nanomaterials, thereby degrading their optical properties such as PLQY (13,17).…”
Section: Introductionmentioning
confidence: 99%
“…6(f)). 60 The formed robust cross-linked QD film exhibited insensitivity to oxygen or water. Furthermore, using the crosslinked InP QDs as the emissive layer, their QD-LED showed a peak CE of 23.04 cd A À1 , which was even 158% higher than that of their conventional counterpart.…”
Section: Cross-linked and Patterned Qd Emissive Layermentioning
confidence: 99%
“…Direct optical lithography, a method in which QDs are patterned directly by the light-induced change in solubility, is considered to be an effective patterning technique that can produce definition patterns over large areas on desired substrates . Several approaches based on different photochemical mechanisms have been proposed, such as polarity change, unsaturated double bond cross-linking, thiol–ene, , azide, or benzophenone cross-linking, and so on. Talapin et al developed a general strategy by modifying the colloidal solubility of QDs through chemical transformation of photoactive ligands on the surface of QDs. , A different strategy, is to use photoactive additives containing azide groups as a promising “linking agent” to cross-link the native surface ligands under UV irradiation .…”
Section: Introductionmentioning
confidence: 99%