2006
DOI: 10.1088/0953-8984/18/33/s04
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Light-induced molecular motion of azobenzene-containing molecules: a random-walk model

Abstract: Since it was first evidenced in 1995, light-induced mass motion in layers of azobenzene-containing molecules has ledtodiverging interpretations, and it remains partly unexplained. In this paper, we discuss a light-driven randomwalk model where moving chromophores drag the molecule to which they are grafted. It consists in a diffusion motion of the azobenzene functions where each random step follows an isomerizing absorption. After a summary of the main characteristics of the motion, we present the hypotheses o… Show more

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Cited by 51 publications
(40 citation statements)
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“…Comparatively recently a number of materials have been studied for direct surface-relief formation during the exposure process [2][3][4][5][6][7]. The physical interpretation of this incompletely understood phenomenon of light and matter interaction is interesting for many researchers in the field of soft materials like ChVS [8][9][10][11] and azo-polymers [9,[12][13][14][15]. There is a wide range of techniques used for an interpretation of the anisotropic surface-relief modulation process: some of them based on the intensity of light [e.g.…”
Section: Introductionmentioning
confidence: 99%
“…Comparatively recently a number of materials have been studied for direct surface-relief formation during the exposure process [2][3][4][5][6][7]. The physical interpretation of this incompletely understood phenomenon of light and matter interaction is interesting for many researchers in the field of soft materials like ChVS [8][9][10][11] and azo-polymers [9,[12][13][14][15]. There is a wide range of techniques used for an interpretation of the anisotropic surface-relief modulation process: some of them based on the intensity of light [e.g.…”
Section: Introductionmentioning
confidence: 99%
“…The profile of the inscribed PSR structure is determined by the spatial distribution and the polarization condition of the irradiated light pattern [107]. Many models for the PSR mechanism have been proposed so far [108][109][110][111][112][113][114].…”
Section: Micro-and Nanoscale Formationsmentioning
confidence: 99%
“…A number of organic and inorganic materials have been studied for direct surface relief formation during a process of exposure by light or e-beam [2,7,8]. This is very promising for practical applications, since makes it possible to simplify the technology of surface patterning.…”
Section: Introductionmentioning
confidence: 99%