2014
DOI: 10.1364/ao.53.006140
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Light trapping in ultrathin 25  μm exfoliated Si solar cells

Abstract: The optical absorption in 25-μm-thick, single-crystal Si foils fabricated using a novel exfoliation technique for solar cells is studied and improved in this work. Various light-trapping and optical absorption enhancement schemes implemented show that it is possible to substantially narrow the gap in optical absorption loss between the 25 μm Si foils and industry-standard 180-μm-thick Si wafer solar cells. An improvement of absorption by 58% in the near-infrared (740-1200 nm) range is observed for the 25 μm mo… Show more

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Cited by 16 publications
(13 citation statements)
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“…4(g). Based on the measured absorption, the calculated maximum J sc for the F = 0.97 structure without a back-reflector was ≈ 29 mA·cm −2 (external quantum efficiency (EQE) of ≈ 67 %), a value comparable to that obtained for ultra-thin planar silicon wafers [27]. The measured value of 17.4 mA·cm −2 , which includes parasitic absorption of light in the ITO and amorphous layers, then gives a lower bound of 0.6 for the IQE in this prototype device.…”
Section: Discussionsupporting
confidence: 51%
“…4(g). Based on the measured absorption, the calculated maximum J sc for the F = 0.97 structure without a back-reflector was ≈ 29 mA·cm −2 (external quantum efficiency (EQE) of ≈ 67 %), a value comparable to that obtained for ultra-thin planar silicon wafers [27]. The measured value of 17.4 mA·cm −2 , which includes parasitic absorption of light in the ITO and amorphous layers, then gives a lower bound of 0.6 for the IQE in this prototype device.…”
Section: Discussionsupporting
confidence: 51%
“…Experimentally, thin ( w < 100 μm) and very thin ( w < 70 μm) c‐Si cells have been investigated based on various technologies such as sliced/thinned free‐standing wafers, [ 6–11 ] epitaxially grown Si thin layers, [ 12–20 ] exfoliated Si films, [ 19,21 ] Si on insulator (SOI) wafers, [ 22–24 ] and polycrystalline Si thin films. [ 25,26 ] The first very thin c‐Si cell having η > 20% was demonstrated by Wang et al in 1996, [ 6 ] whereby a 21.5% efficient passivated emitter rear locally diffused (PERL) cell was fabricated using float‐zone (FZ) Si wafers ( w = 47 μm) and thinned by chemical etching.…”
Section: Introductionmentioning
confidence: 99%
“…It is worth noting that the efficiency limit is dependent on light trapping scheme and numerical simulation has predicted that η > 30% is possible for very thin c-Si cells (15 μm) by applying advanced light trapping using photonic crystals. [4,5] Experimentally, thin (w < 100 μm) and very thin (w < 70 μm) c-Si cells have been investigated based on various technologies such as sliced/thinned free-standing wafers, [6][7][8][9][10][11] epitaxially grown Si thin layers, [12][13][14][15][16][17][18][19][20] exfoliated Si films, [19,21] Si on insulator (SOI) wafers, [22][23][24] and polycrystalline Si thin films. [25,26] The first very thin c-Si cell having η > 20% was demonstrated by Wang et al in 1996, [6] whereby a 21.5% efficient passivated emitter rear locally diffused (PERL) cell was fabricated using float-zone (FZ) Si wafers (w ¼ 47 μm) and thinned by chemical etching.…”
Section: Introductionmentioning
confidence: 99%
“…Bozzola et al [6] studied the effect of c-Si solar cell thickness variation in the range 10-80 µm to produce efficiency 15-19%. M. Hilali et al fabricated a 25 µm c-Si solar cell using exfoliation technique to improve the optical absorption [7]. A 30 µm thick c-Si solar cell is theoretically optimized using a double back reflector layer to enhance the efficiency about 19.28% [8].…”
Section: Introductionmentioning
confidence: 99%