Two-dimensional wide-line separation (WISE) NMR spectroscopy has been applied to obtain structural correlation in fluorocarbon films deposited via a pulsed plasma enhanced chemical vapor deposition. Films from two pulsed deposition conditions, 10/20 and 10/400 ms on/off times, were analyzed in detail. Onedimensional 19 F and 13 C NMR results agreed well with prior studies of these films using X-ray photoelectron spectroscopy, which showed greater CF 2 fractions with decreasing pulsed deposition duty cycle. 13 C CPMAS studies, in addition, distinguished between unsaturated and saturated fluorocarbon species in these films. However, 19 F-13 C WISE allowed further differentiation of fluorocarbon moieties by the difference in nearestneighbor connectivity. The 10/20 film showed a prevalence of at least two inequivalent CF 3 species. A weak presence of unsaturated )CF-species was also detected. No specific CF 2 moiety was resolved, which was attributed to significant chemical shift dispersion and heterogeneity in CF 2 bonding environment. In contrast, the 10/400 film displayed an increased proportion of CF 2 species, predominantly as -CF 2 CF 2 -and CF 3 CF 2 -groups, and less CF 3 termination, indicative of a structure approaching that of poly(tetrafluoroethylene). These observations support the hypothesis of a less aggressive deposition environment, inducing less cross-links and unsaturation and promoting linear chain propagation, with a longer pulse off-time during deposition. Spinning sideband patterns in the 19 F dimension of NMR spectra did not severely hinder spectral interpretation but instead offered a means of revealing motional differences in the fluorocarbon moieties.