Abstract:This paper concerns the determination of the band structure of physical systems with reduced dimensionality with the method of the linear combination of bulk band (LCBB), according to the full-band energy dispersion of the underlying crystal. The derivation of the eigenvalue equation is reconsidered in detail for quasi-two-dimensional (2D) and quasi-one-dimensional (1D) systems and we demonstrate how the choice of the volume expansion in the three-dimensional reciprocal lattice space is important in order to o… Show more
“…Its value depends on the number N of trigonometric functions / n used in the calculation. As discussed in detail in [15] the expansion of Eq. (3) should be performed within an appropriate expansion volume such as nP=L A 6 2P=a, 8n 6 N (which can be satisfied with L A ¼ Na=2 [23]).…”
Section: Luttinger-kohn Envelop Function Approximationmentioning
confidence: 99%
“…This constraint is imposed in order to establish a unique relationship between the envelope-function theory and the microscopic k.p theory from which it was derived [20,15]. For that reason, the straightforward transformation in real space k z Ài d dz ( leading to a set of local coupled differential equations [17]) gives rise to nonvanishing envelope-functions Fourier components F i ðkÞ outside the first BZ, and generates an error in the kinetic energy [20].…”
Section: Luttinger-kohn Envelop Function Approximationmentioning
confidence: 99%
“…For that reason, the physics and electronic device community is actively developing far more computationally efficient semi-empirical approaches, that can work out the electronic structure of strained semiconductor devices. In this context, the 'full-band' semi-empirical computational methods fall into two general categories: The atomistic approach such as the tight-binding (TB) [5,6] and atomistic linear combination of bulk bands (LCBB) [7] and alternatively, models that use a continuous description of the matter such as a 'full-zone'-k.p model [8,9] within the ''envelope-function approximation" (EFA) [10][11][12][13][14] and empirical pseudo-potential within the k-space LCBB [15,16].…”
“…Its value depends on the number N of trigonometric functions / n used in the calculation. As discussed in detail in [15] the expansion of Eq. (3) should be performed within an appropriate expansion volume such as nP=L A 6 2P=a, 8n 6 N (which can be satisfied with L A ¼ Na=2 [23]).…”
Section: Luttinger-kohn Envelop Function Approximationmentioning
confidence: 99%
“…This constraint is imposed in order to establish a unique relationship between the envelope-function theory and the microscopic k.p theory from which it was derived [20,15]. For that reason, the straightforward transformation in real space k z Ài d dz ( leading to a set of local coupled differential equations [17]) gives rise to nonvanishing envelope-functions Fourier components F i ðkÞ outside the first BZ, and generates an error in the kinetic energy [20].…”
Section: Luttinger-kohn Envelop Function Approximationmentioning
confidence: 99%
“…For that reason, the physics and electronic device community is actively developing far more computationally efficient semi-empirical approaches, that can work out the electronic structure of strained semiconductor devices. In this context, the 'full-band' semi-empirical computational methods fall into two general categories: The atomistic approach such as the tight-binding (TB) [5,6] and atomistic linear combination of bulk bands (LCBB) [7] and alternatively, models that use a continuous description of the matter such as a 'full-zone'-k.p model [8,9] within the ''envelope-function approximation" (EFA) [10][11][12][13][14] and empirical pseudo-potential within the k-space LCBB [15,16].…”
“…An approach based on the full band structure computed with the empirical pseudo-potential method (EPM) [44] is promising and has been recently generalized to include strain and spin-orbit interaction [45]. Although it uses a realistic band structure, the method is computationally demanding and needs to be improved to include the selfconsistent solution of Poisson equation.…”
Section: Challenges Of N-channel Mosfet Modelingmentioning
We review modeling techniques used to compute strain induced performance enhancement of modern MOSFETs. While p-channel MOSFETs were intensively studied, electron transport in strained structures received surprisingly little attention. A rigorous analysis of the subband structure in thin silicon films under stress is performed. Calculated subband effective masses are shown to strongly depend on shear strain and film thickness. A decrease of the transport effective mass under tensile stress in [110] direction and an additional splitting between the unprimed subbands with the same quantum number guarantees a mobility enhancement even in ultra-thin (001) silicon films. This increase of mobility and drive current combined with the improved channel control makes multi-gate MOSFETs based on thin films or silicon fins preeminent candidates for the 22 nm technology node and beyond.Keywords MOSFETs modeling · Shear strain · Two-band k·p model for conduction band · Valley splitting · Mobility and current enhancement
“…Recently the Linear Combination of Bulk Bands (LCBB) method [66][67][68] has been used jointly with a non-local pseudopotential solver to calculate the band-structure in electron and hole inversion layers by accounting at the same time for both the strain and the quantization effects [69]. The overall procedure is computationally demanding, but the results can be used to test the accuracy of the simpler models, such as the EMA or the k · p approach.…”
Section: Energy Dispersion In Strained N-mos Transistorsmentioning
This paper reviews the basic methodologies and models used in the semi-classical modelling of CMOS transistors in the framework of the nowadays generalized scaling scenario. The capabilities to describe devices with arbitrary crystal orientations and strain configurations are discussed. Several simulation results are illustrated and compared to the experiments to assess the understanding of the underlying physics and the predictive capabilities of the models. A case study concerning the drain currents in nano-scale uniaxially strained MOSFETs is presented and it shows how the strain engineering may change the traditional on-current disadvantage of the p-MOS compared to the n-MOS transistors.
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