Liquid-immersion inclined-rotated exposure system for fabricating three-dimensional microstructures with large inclination angles
Gakuto Kagawa,
Hidetoshi Takahashi
Abstract:This study utilized liquid-immersion inclined-rotated ultraviolet (UV) lithography to fabricate three-dimensional (3D) microstructures. The maximum achievable inclination angles obtained through conventional inclined-rotated exposure (IRE) methods were limited by the significant refractive index differences in material. We proposed an IRE with liquid-immersion and adjustable mirrors, which enabled greater inclination angles with improved adjustability. Using liquid as a medium helped minimize the refractive in… Show more
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