2007
DOI: 10.1016/j.tsf.2007.03.184
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Liquid phase deposition of TiO2 on glass: Systematic comparison to films prepared by sol–gel processing

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Cited by 42 publications
(20 citation statements)
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“…And the recovery of phosphopeptides was decreased when calcined SiO 2 -1LPD (800 • C) was used as phosphopeptides adsorbent. In addition, it was reported the TiO 2 film prepared by liquid phase deposition (LPD) cracked after the thermal treatment at 600 • C, which leaded to the cleavage of surface-film interaction [45]. Therefore, high calcined temperature was not applied in the preparation of SiO 2 -nLPD.…”
Section: Phosphopeptide Enrichment With Sio 2 -Nlpd Spheresmentioning
confidence: 99%
“…And the recovery of phosphopeptides was decreased when calcined SiO 2 -1LPD (800 • C) was used as phosphopeptides adsorbent. In addition, it was reported the TiO 2 film prepared by liquid phase deposition (LPD) cracked after the thermal treatment at 600 • C, which leaded to the cleavage of surface-film interaction [45]. Therefore, high calcined temperature was not applied in the preparation of SiO 2 -nLPD.…”
Section: Phosphopeptide Enrichment With Sio 2 -Nlpd Spheresmentioning
confidence: 99%
“…LPD is another convenient, room temperature, solution-based method of creating highly uniform, thin layers of nanoparticles on the surface of an object [19,20]. With this technique, TiO 2 nanoparticles precipitate out of a hydrolysis reaction of ammonium hexafluorotitanate, (NH 4 ) 2 TiF 6 , assisted by boric acid, H 3 BO 3 .…”
Section: Layer-by-layer Self-assembly and Liquid Phase Depositionmentioning
confidence: 99%
“…Rutile is the most stable form of TiO 2 , whereas anatase and brookite are metastable and transform to the rutile phase upon heating [6,[12][13][14]. Conventional methods to prepare TiO 2 thin films are pulsed laser deposition (PLD) [15,16], RF magnetron sputtering [17][18][19] plasma enhanced chemical vapor deposition [20], and sol-gel methods [6,15,21,22], among others. Focusing on the solgel method, it is one of the most attractive techniques for thin-film deposition, because of low cost, non-vacuum requirements, large area deposition, and low temperature processing.…”
Section: Introductionmentioning
confidence: 99%