Liquid-phase sintering of nanodiamond composite coatings on aluminum A319 using a focused laser beam

Blum, Rodger; Molian, Pal

doi:10.1016/j.surfcoat.2009.06.025

Cited by 10 publications

(1 citation statement)

References 44 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The surface decoration of NPs is very necessary in providing them unique chemical, electrical, biological, or thermal properties (5). Conventional liquid-phase synthesis has been widely used to modify particle surfaces, which is usually suffering from residual surfactants in the coatings and the film thickness control is relatively complicated (6). As an unique gas-phase deposition method, atomic layer deposition (ALD) based on self-limited chemisorption mechanism is very attractive in depositing conformal, pinhole-free films with atomic level controllability, and has shown great potentials for various coating materials on different nanoparticles (7).…”

Section: Introductionmentioning

confidence: 99%

A Rotation Fluidization Coupled Atomic Layer Deposition Reactor for Nanoparticle Coating

Chen¹,

Chen²

2016

ECS Trans.

View full text Add to dashboard Cite

Atomic layer deposition (ALD) is an attractive approach for precisely controllable and conformal coating on nanoparticles (NPs). Compared with flat substrates, NPs have very large specific surface area, form agglomerate and stack together during deposition. Therefore, special reactor and process are needed to promote the precursor diffusion for uniform deposition and efficient process. In this paper, an ALD reactor is introduced which uses fluidization to facilitate precursor transport and couples rotation to intensify the dynamic dismantling of soft-agglomerates, exposing individual particle to precursors. In situ mass spectrometry monitoring of the reaction shows nearly 100% precursor utilization with proper deposition process. The linear relationship of statistical element mass concentrations with deposition cycles demonstrates the precise controllability. The microscale morphology of the Al2O3 coated SiO2, Fe3O4, CeO2 and AlH3 NPs shows the uniformity and conformity of the films on individual particles, which reveals the generosity of the reactor on various nanostructures.

show abstract

Section: Introductionmentioning

confidence: 99%