This paper presents a mathematical model for the electrochemical impregnation of nickel hydroxide in the type of porous nickel plaque used commonly in the positive electrode of Ni/Cd and
normalNi/H2
cells. The model includes the transport of
Ni2+,NO3−,OH−
, and
H+
ions the electrochemical reduction of
NO3−
, and the homogenous acid/base and precipitation reactions. The effect of plaque thickness, plaque tortuosity, and applied current density on the time‐dependent porosity distribution and on the uniformity of
normalNifalse(OH)2
loading are discussed. Predictions for both constant‐current and constant‐potential operating conditions are presented. It is shown that a change in tortuosity from 1.6 to 3.0 can yield a 27% decrease in uniformity at 30 mA/cm2 for a 0.075 cm thick plaque at 1.6 g/cm3 of void loading. It is also shown that when the current density is changed from 30 to 40 mA/cm2, the uniformity decreased by 20% for a plaque of the same thickness with a tortuosity of 1.6 at the same loading. The model could be used to develop quality‐control tools to insure a uniformly loaded plaque during electrochemical impregnation.