Litho resist rework influences on Cu metal layer patterning with TiN-hard mask

Dankelmann, Marcus; Czekalla, M.; Estel, H.; Hahn, J.; Hong, Bee Kim; Lamm, Mario; Neubert, Eric; Renner, Michael; Scheibel, Rainer; Stegemann, Maik; Schneider, Jens

doi:10.1117/12.2045307

SPIE Proceedings

2014

DOI: 10.1117/12.2045307

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Litho resist rework influences on Cu metal layer patterning with TiN-hard mask

Marcus Dankelmann

M. Czekalla

H. Estel

et al.

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Litho resist rework influences on Cu metal layer patterning with TiN-hard mask

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