Lithographic patterning of nanoparticle films self-assembled from organic solutions by using a water-soluble mask

Harnack, O.; Raible, Isabelle; Yasuda, Akio; Voßmeyer, Tobias

doi:10.1063/1.1856700

Cited by 18 publications

(22 citation statements)

References 22 publications

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“…Numerous methods have been reported for depositing MPN films, including spray-or solvent-casting [1], [5], [11], Langmuir-Blodgett film transfer [26], [27], layer by layer deposition [10], [13], metal-complexation by carboxylate-terminated thiolate ligands [7], and precipitation via place-exchange reactions with dithiolates or dicarboxylic acids [4], [6]. Methods that have been applied to patterning MPN films include the use of a nanowire shadow mask coupled with Ar-ion etching [28], a liftoff method that relies on prepatterned sacrificial layers [29], stamping/printing followed by gas-phase dithiol-induced linking [8], and electron-beam (e-beam) induced crosslinking (EBIX) [27], [30].…”

Section: Introductionmentioning

confidence: 99%

Electron-Beam Patterned Monolayer-Protected Gold Nanoparticle Interface Layers on a Chemiresistor Vapor Sensor Array

et al. 2011

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Use of electron-beam induced crosslinking (EBIX) to pattern films of thiolate-monolayer-protected gold-nanoparticles (MPNs) on chemiresistor (CR) vapor sensors is described. MPNs with alkyl, cyanoalkyl, phenoxyalkyl, and hydroxyfluoroalkyl thiolate tail groups were patterned on integrated arrays of interdigital electrodes using electron doses of 500-750 C=cm 2 . The dc resis- tances of solvent cast films of these MPNs decrease and the baseline-normalized changes in resistance to each of five organic vapors increase to different degrees with increasing electron-beam dose. Relative responses patterns from an array of MPN-coated CR sensors for the test vapors change after EBIX patterning and the diversity of responses is diminished, on average, but it is still projected to be sufficient for the discrimination of most of the individual test vapors and binary mixtures. Results are rationalized in terms of expected changes in ligand structures and film properties following EBIX patterning using known models of electronic conduction, and vapor-induced changes of conduction, through MPN films. The implications of the results for creating arrays of densely packed MPN-coated CRs as detectors for microanalytical systems are considered.Index Terms-Chemiresistor, electron beam, nanoparticle, sensor array, vapor sensor.

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Section: Introductionmentioning

confidence: 99%

Electron-Beam Patterned Monolayer-Protected Gold Nanoparticle Interface Layers on a Chemiresistor Vapor Sensor Array

et al. 2011

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“…21,22,23,24 This method requires a SAM chemical treatment of a region to be patterned followed by a QD coating of the surface. Once a key-lock pair is formed between the patterned SAM molecule and the ligand molecule of the QDs, the excessive QDs are removed from the surface, leaving the patterned QDs only on top of the predefined SAM of key molecules.…”

Section: Introductionmentioning

confidence: 99%

Nanoscale patterning of colloidal quantum dots for surface plasmon generation

et al. 2013

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The patterning of colloidal quantum dots with nanometer resolution is essential for their application in photonics and plasmonics. Several patterning approaches, such as the use of polymer composites, molecular lock-and-key methods, inkjet printing, and microcontact printing of quantum dots, have limits in fabrication resolution, positioning and the variation of structural shapes. Herein, we present an adaptation of a conventional liftoff method for patterning colloidal quantum dots. This simple method is easy and requires no complicated processes. Using this method, we formed straight lines, rings, and dot patterns of colloidal quantum dots on metallic substrates. Notably, patterned lines approximately 10 nm wide were fabricated. The patterned structures display high resolution, accurate positioning, and well-defined sidewall profiles. To demonstrate the applicability of our method, we present a surface plasmon generator elaborated from quantum dots.

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“…These difficulties result in restricted usage and applications of QDs in diverse fields of photonics and plasmonics. [21][22][23][24] This method uses a SAM chemical treatment of a region to be patterned followed by a QD coating of the surface. [14][15][16][17] The photo-curing patterning of nanocrystals shows fabrication resolutions larger than 2 μm and reduced luminescence intensity per unit volume compared to that of pristine QDs.…”

Section: Introductionmentioning

confidence: 99%

Patterning of colloidal quantum dots for the generation of surface plasmon

Park

Roh

Kim

et al. 2013

J. Micro/Nanolith. MEMS MOEMS

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Patterning of colloidal quantum dot (QD) of a nanometer resolution is important for potential applications in micro-or nanophotonics. Several patterning techniques such as polymer composites, molecular key-lock methods, inkjet printing, and the microcontact printing of QDs have been successfully developed and applied to various plasmonic applications. However, these methods are not easily adapted to conventional complementary metal-oxide semiconductor (CMOS)-compatible processes because of either limits in fabrication resolutions or difficulties in sub-100-nm alignment. Here, we present an adaptation of a conventional lift-off method for the patterning of colloidal QDs. This simple method can be later applied to CMOS processes by changing electron beam lithography to photolithography for building up photon-generation elements in various planar geometries. Various shapes formed by colloidal QD clusters such as straight lines, rings, and dot patterns with sub-100-nm size could be fabricated. The patterned structures show sub-10-nm positioning with good fluorescence properties and well-defined sidewall profiles. To demonstrate the applicability of our method, we present a surface plasmon generator from a QD cluster. Downloaded From: http://nanolithography.spiedigitallibrary.org/ on 05/18/2015 Terms of Use: http://spiedl.org/terms J. Micro/Nanolith. MEMS MOEMS 041202-4 Oct-Dec 2013/Vol. 12(4) Park et al.: Patterning of colloidal quantum dots for the generation of surface plasmon Downloaded From: http://nanolithography.spiedigitallibrary.org/ on 05/18/2015 Terms of Use: http://spiedl.org/terms

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Lithographic patterning of nanoparticle films self-assembled from organic solutions by using a water-soluble mask

Cited by 18 publications

References 22 publications

Electron-Beam Patterned Monolayer-Protected Gold Nanoparticle Interface Layers on a Chemiresistor Vapor Sensor Array

Electron-Beam Patterned Monolayer-Protected Gold Nanoparticle Interface Layers on a Chemiresistor Vapor Sensor Array

Nanoscale patterning of colloidal quantum dots for surface plasmon generation

Patterning of colloidal quantum dots for the generation of surface plasmon

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