Lithographic Resists

Hinsberg, W. D.; Wallraff, G. M.; Allen, R. D.

doi:10.1002/0471238961.1209200808091419.a01

Cited by 3 publications

(4 citation statements)

References 59 publications

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“…Phenolic polymers (for example, m -cresol novolacs and poly(4-hydroxystyrene) derivatives) have been used extensively in photoresists intended for patterning using ultraviolet light of wavelengths of 248 nm and greater …”

Section: Reactive Dissolution In Resist Materialsmentioning

confidence: 99%

“…Reactive swelling and dissolution of drug/polymer composites are used for the controlled release of therapeutic agents in biological systems, and there have been numerous studies of their function in that context . Reactive dissolution also serves as the foundation for imaging of all modern polymeric photoresist materials . Here a radiation-induced patternwise chemical modification of a thin polymeric film alters its dissolution properties such that exposed and unexposed regions can be differentiated when immersed in an appropriate developer solution.…”

Section: Introductionmentioning

confidence: 99%

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Characterization of Reactive Dissolution and Swelling of Polymer Films Using a Quartz Crystal Microbalance and Visible and Infrared Reflectance Spectroscopy

et al. 2005

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Dissolution and swelling of thin films of ionizable polymers in contact with aqueous alkaline solutions are examined using a quartz crystal microbalance, while simultaneously recording the visible reflectivity and infrared absorption of the evolving films. From these data changes in the thickness, depth structure, composition, mass, and mechanical properties of the polymer film during its interaction with the aqueous solution can be detected. Analysis of these provides evidence for the formation of interfacial gel layers resulting from acid−base reaction of the polymer with the hydroxide solution and yields information on the kinetics of transport and chemical reaction that control the overall process. Kinetics simulations indicate that the most important factors influencing observed behaviors are the intrinsic reactivity of ionizable groups on the polymer and the response of the film's mechanical properties, which determine the ability of small molecules to move through it, to incorporation of water.

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Section: Reactive Dissolution In Resist Materialsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Characterization of Reactive Dissolution and Swelling of Polymer Films Using a Quartz Crystal Microbalance and Visible and Infrared Reflectance Spectroscopy

et al. 2005

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“…This paper reports the behavior of resistance for materials and experimental conditions of relevance to the photoresist development process used in microlithographic imaging . This paper also addresses the application of a physical model 6,9 to relate the resistance behavior to viscoelastic properties (shear viscosity η and elastic modulus μ) of polymer films.…”

mentioning

confidence: 99%

Determination of the Viscoelastic Properties of Polymer Films Using a Compensated Phase-Locked Oscillator Circuit

2001

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Using a combination of the quartz crystal microbalance and a corresponding physical model for the compound resonator, the viscoelastic properties of polymer films have been studied. By using a compensated phase-locked oscillator system, both resonant frequency and resistance (motional resistance of the Butterworth-Van Dyke equivalent circuit) can be measured simultaneously. The behavior of resistance as a function of film thickness or corresponding frequency shift provides a means not only for quantitatively determining the shear viscosity and elastic modulus of films but also for qualitatively comparing various systems. The physical model is extended to include four layers for describing dissolving/swelling films that form an energy-dissipative, interfacial layer. If the underlying film is rigid and acoustically thin, then the four-layer case can be reduced to a simplified three-layer description.

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“…In deep ultraviolet (DUV), resists operate with photochemistry. 1 Photochemistry is specific and relatively well studied, 1,2 making function-specific engineering possible. For example, it is understood that photon absorption is only useful if it happens at the photoacid generator (PAG).…”

Section: Introductionmentioning

confidence: 99%

Investigating extreme ultraviolet radiation chemistry with first-principles quantum chemistry calculations

Heidkamp

Wang

Neureuther

et al. 2020

J. Micro/Nanolith. MEMS MOEMS

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In extreme ultraviolet (EUV) lithography, chemistry is driven by secondary electrons. A deeper understanding of these processes is needed. However, electron-driven processes are inherently difficult to experimentally characterize for EUV materials, impeding targeted material engineering. A computational framework is needed to provide information for rational material engineering and identification at a molecular level. We demonstrate that density functional theory calculations can fulfill this purpose. We first demonstrate that primary electron energy spectrum can be predicted accurately. Second, the dynamics of a photoacid generator upon excitation or electron attachment are studied with ab-initio molecular dynamics calculations. Third, we demonstrate that electron attachment affinity is a good predictor of reduction potential and dose to clear. The correlation between such calculations and experiments suggests that these methods can be applied to computationally screen and design molecular components of EUV material and speed up the development process.

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Lithographic Resists

Cited by 3 publications

References 59 publications

Characterization of Reactive Dissolution and Swelling of Polymer Films Using a Quartz Crystal Microbalance and Visible and Infrared Reflectance Spectroscopy

Characterization of Reactive Dissolution and Swelling of Polymer Films Using a Quartz Crystal Microbalance and Visible and Infrared Reflectance Spectroscopy

Determination of the Viscoelastic Properties of Polymer Films Using a Compensated Phase-Locked Oscillator Circuit

Investigating extreme ultraviolet radiation chemistry with first-principles quantum chemistry calculations

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