Lithography continues to drive Moore's law

Abstract

Lithography continues to drive Moore's law Martin van den Brink The semiconductor industry relies on perpetual miniaturization, and for this to continue requires a holistic approach to the entire lithography process and a move to extreme UV lithography.

Three-dimensional aerial images of periodic patterns and the depth of focus for lines-and-spaces patterns

“…Because sin δ0=λ/(2p)=0.34, s/2=Δσ sin θ/2=0.06 may be too large a variation for Eq. (9) to be accurate; a smaller pupil-fill ratio in the future 9 will certainly improve the accuracy of Eq. (12) and offer an even greater DOF.…”