Lithography for the 32-nm Node and Beyond

Abstract

This review article presents, discusses and compares three emerging photo lithography techniques for use in future BiCMOS fabrication processes: EUV lithography, e-beam direct write, and nano imprint. Specific challenges are discussed and the state-of-the-art is illustrated with respect to bipolar device scaling.Index Terms -Silicon bipolar/BiCMOS process technology, bipolar scaling, photo lithography, EUV, Ebeam, nano imprint.