2005
DOI: 10.1117/12.600413
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Lithography tool qualification using angular scatterometry

Abstract: Lithography process control remains a significant challenge in modern semiconductor manufacturing. Metrology efforts must overcome the complexity of the lithography process, as well as the number of process elements that contribute to overall process yield. One specific area of concern is lithography tool focus control. It is vital to control photolithography tool focus during the photoresist development step with a high degree of precision and accuracy. Furthermore, dose variations can compound the difficulty… Show more

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