Local deposition of high-purity Pt nanostructures by combining electron beam induced deposition and atomic layer deposition

Abstract

Please check the document version of this publication:• A submitted manuscript is the version of the article upon submission and before peer-review. There can be important differences between the submitted version and the official published version of record. People interested in the research are advised to contact the author for the final version of the publication, or visit the DOI to the publisher's website.• The final author version and the galley proof are versions of the publication after peer review.• The final published version features the final layout of the paper including the volume, issue and page numbers. Link to publication General rightsCopyright and moral rights for the publications made accessible in the public portal are retained by the authors and/or other copyright owners and it is a condition of accessing publications that users recognise and abide by the legal requirements associated with these rights.• Users may download and print one copy of any publication from the public portal for the purpose of private study or research.• You may not further distribute the material or use it for any profit-making activity or commercial gain • You may freely distribute the URL identifying the publication in the public portal.If the publication is distributed under the terms of Article 25fa of the Dutch Copyright Act, indicated by the "Taverne" license above, please follow below link for the End User Agreement: www.tue.nl/taverne Take down policy If you believe that this document breaches copyright please contact us at:openaccess@tue.nl providing details and we will investigate your claim. An approach for direct-write fabrication of high-purity platinum nanostructures has been developed by combining nanoscale lateral patterning by electron beam induced deposition ͑EBID͒ with area-selective deposition of high quality material by atomic layer deposition ͑ALD͒. Because virtually pure, polycrystalline Pt nanostructures are obtained, the method extends the application possibilities of EBID, whereas compared to other area-selective ALD approaches, a much higher resolution is attainable; potentially down to sub-10 nm lateral dimensions.

Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition

“…It has been found that the area selectivity of an ALD process toward specific materials, such as noble metals, can be achieved by tuning the process parameters, e.g. the temperature [40], the pressure [41], the nature of the coreactant or combinations thereof [36,37]. Key for these selective ALD processes of noble metals, such as Pt and Pd, is their catalytic activity.…”

Resist-free fabricated carbon nanotube field-effect transistors with high-quality atomic-layer-deposited platinum contacts

“…[20][21][22] This so-called direct-write ALD approach combines area-selective ALD 23,24 with the directwrite patterning technique of electron beam induced deposition (EBID) 25,26 as illustrated in Fig. 1.…”

Review Article: Catalysts design and synthesis via selective atomic layer deposition

“…O 2 dissociation usually prefers to take place on a metal surface, leading to the formation of active oxygen atoms to decompose and activate MeCpPtMe 3 molecules for the following reactions. [55][56][57] Kessels and coworkers reported that when the O 2 partial pressure decreased to 7.5 mTorr, the growth of Pt on Al 2 O 3 was inhibited. 36 No Pt growth was observed on Al 2 O 3 surface even after 600 cycles.…”

“…The dissociation of chemisorbed O 2 on the catalytic Pt group metal was a key step in the selective ALD mechanism. 55,57 The Pt ALD process at 7.5 mTorr could be considered as selective condition to Pd versus Al 2 O 3 substrate. Figure 2 shows the high-angle annular dark-field scanning transmission electron microscopy (HAADF-STEM) image and electron energy loss spectroscopy (EELS) line scan to confirm the Pd@Pt core shell structure fabricated with this selective ALD method.…”