2024
DOI: 10.1299/transjsme.23-00232
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Local dose distribution and changing resist cross-sectional shapes in electron beam lithography

Tatsuki SUGIHARA,
Arata KANEKO

Abstract: In order to apply resist patterns fabricated by electron beam lithography to nanoimprint molds, it is necessary to consider not only line widths and hole diameters observed two-dimensionally from the exposure top surface, but also three-dimensionally including resist cross-sectional shapes. In this study, we focus on the dose distribution inside the pattern and the development time, and investigate the effects of these on the cross-sectional shape of the resist. An exposure method was employed to produce a res… Show more

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