2022
DOI: 10.1016/j.apsusc.2022.153503
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Local phase transition at crack edges of Mo1−W Te2 polymorphs

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Cited by 3 publications
(1 citation statement)
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“…TMD-based 2D metal–semiconductor heterostructures exhibit ohmic contact behavior with low contact resistance, which is an effective approach for high-performance 2D electronics. , Therefore, the phase-controlled synthesis of large-scale 2D metal–semiconductor heterostructures based on TMDs shows promising applications. The existing phase-engineering methods usually suffer from poor spatial controllability, small-scale production, and poor material compatibility. , In addition, most of the 2D metal–semiconductor structures suitable for large-area integration use a two-step chemical vapor deposition (CVD) growth process, which puts forward high requirements for the secondary growth compatibility of the materials. It is in tight demand to devise a spatially controlled and scalable one-step phase-engineering growth method for directly synthesizing metal–semiconductor heterostructure arrays of TMDs.…”
mentioning
confidence: 99%
“…TMD-based 2D metal–semiconductor heterostructures exhibit ohmic contact behavior with low contact resistance, which is an effective approach for high-performance 2D electronics. , Therefore, the phase-controlled synthesis of large-scale 2D metal–semiconductor heterostructures based on TMDs shows promising applications. The existing phase-engineering methods usually suffer from poor spatial controllability, small-scale production, and poor material compatibility. , In addition, most of the 2D metal–semiconductor structures suitable for large-area integration use a two-step chemical vapor deposition (CVD) growth process, which puts forward high requirements for the secondary growth compatibility of the materials. It is in tight demand to devise a spatially controlled and scalable one-step phase-engineering growth method for directly synthesizing metal–semiconductor heterostructure arrays of TMDs.…”
mentioning
confidence: 99%