Abstract:Objectives. Focused ion beam etching remains one of the most common methods for fabricating 2D photonic crystals and structures based on functional materials. This technique is quite well developed for semiconductors. But at the same time, the change in the properties of ferroelectric materials under the action of a focused ion beam, including parameters of distribution and switching of the polarization state under the action of an electric field, remains poorly studied. The purpose of this work is to determin… Show more
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