2008
DOI: 10.1063/1.2965802
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Local structure of indium oxynitride from x-ray absorption spectroscopy

Abstract: Synchrotron x-ray absorption near edge structures (XANES) measurements of In L3 edge is used in conjunction with first principles calculations to characterize rf magnetron sputtered indium oxynitride at different O contents. Good agreement between the measured and the independently calculated spectra are obtained. Calculations show that the XANES spectra of this alloy are sensitive to the coordination numbers of the In atoms, i.e., fourfold for indium nitride-like structures and sixfold for indium oxide-like s… Show more

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Cited by 39 publications
(27 citation statements)
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“…As pointed out in a recent study [26] on indium oxy-nitride (wurtzite-type structure), the presence of a -white line‖ in In L 3 -edge XANES spectrum denotes the occurrence of non-occupied electronic states in indium atoms. The two shoulders observed in the spectra collected from the ore sample, separated by 10 eV (at 3732 eV and at 3742 eV), possibly indicate electronic transitions to unoccupied d states above the Fermi level and may be formally assigned to 2p  5s electronic transitions, enhanced by an s-d hybridization [27,28].…”
Section: Comments and Conclusionmentioning
confidence: 99%
“…As pointed out in a recent study [26] on indium oxy-nitride (wurtzite-type structure), the presence of a -white line‖ in In L 3 -edge XANES spectrum denotes the occurrence of non-occupied electronic states in indium atoms. The two shoulders observed in the spectra collected from the ore sample, separated by 10 eV (at 3732 eV and at 3742 eV), possibly indicate electronic transitions to unoccupied d states above the Fermi level and may be formally assigned to 2p  5s electronic transitions, enhanced by an s-d hybridization [27,28].…”
Section: Comments and Conclusionmentioning
confidence: 99%
“…InON thin films in this study were grown by reactive gas‐timing RF magnetron sputtering technique . The thin films with thickness of 1 µm were prepared on silicon substrates at room temperature.…”
Section: Methodsmentioning
confidence: 99%
“…With this reactive gas‐timing technique, thin films with different nitrogen and oxygen contents can be prepared by varying N 2 :O 2 gas‐timing ratio. Jiraroj et al . studied local structure of InON thin films deposited on polyethylene terephthalate substrates prepared by this reactive gas‐timing sputtering technique.…”
Section: Introductionmentioning
confidence: 99%
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